TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
First Claim
Patent Images
1. A method of manufacturing a transistor, the method comprising forming a gate on a substrate;
- forming a spacer on lateral side walls of the gate and on an adjacent portion of the substrate;
modifying material of the spacer such that the modified spacer covers only a lower portion of the lateral side walls of the gate;
providing source/drain regions in the modified spacer.
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Abstract
A method of manufacturing a transistor (300), the method comprising forming a gate (101) on a substrate (102), forming a spacer (201) on lateral side walls of the gate (101) and on an adjacent portion (202) of the substrate (102), modifying material of the spacer (201) so that the modified spacer (301) covers only a lower portion (303) of the lateral side walls of the gate (101), and providing source/drain regions (301) in the modified spacer (301).
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Citations
15 Claims
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1. A method of manufacturing a transistor, the method comprising forming a gate on a substrate;
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forming a spacer on lateral side walls of the gate and on an adjacent portion of the substrate; modifying material of the spacer such that the modified spacer covers only a lower portion of the lateral side walls of the gate; providing source/drain regions in the modified spacer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 15)
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10. A transistor, the transistor comprising
a substrate; -
a gate on the substrate; a spacer which covers only a lower portion of lateral side walls of the gate and a portion of the substrate; source/drain regions in the spacer. - View Dependent Claims (11, 12, 13, 14)
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Specification