OPTICAL DIODE STRUCTURE AND MANUFACTURING METHOD THEREOF
First Claim
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1. An optical diode structure, comprising:
- a semiconductor substrate;
a luminous layer disposed over the semiconductor substrate for emitting light;
a first type semiconductor layer formed between the semiconductor substrate and the luminous layer; and
a second type semiconductor layer having a first surface and a second surface, wherein the first surface is in contact with the luminous layer, and a rough-surfaced grating structure is formed in the second surface for modulating the light emitted by the luminous layer, thereby increasing light extraction efficiency of the luminance layer.
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Abstract
An optical diode structure includes a semiconductor substrate, a luminous layer, a first type semiconductor layer and a second type semiconductor. The luminous layer is disposed over the semiconductor substrate for emitting light. The first type semiconductor layer is formed between the semiconductor substrate and the luminous layer. The second type semiconductor layer has a first surface and a second surface. The first surface is in contact with the luminous layer. A rough-surfaced grating structure is formed in the second surface for modulating the light emitted by the luminous layer, thereby increasing light extraction efficiency of the luminance layer.
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Citations
20 Claims
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1. An optical diode structure, comprising:
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a semiconductor substrate; a luminous layer disposed over the semiconductor substrate for emitting light; a first type semiconductor layer formed between the semiconductor substrate and the luminous layer; and a second type semiconductor layer having a first surface and a second surface, wherein the first surface is in contact with the luminous layer, and a rough-surfaced grating structure is formed in the second surface for modulating the light emitted by the luminous layer, thereby increasing light extraction efficiency of the luminance layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A process of manufacturing an optical diode structure, the process comprising steps:
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providing a semiconductor substrate; forming a luminous structure over the semiconductor substrate; forming a roughening region in the luminous structure; and performing a photolithography and etching procedure on the luminous structure, thereby forming a rough-surfaced grating structure in the roughening region of the luminous structure. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification