EXPOSURE APPARATUS

• US 20100183987A1
• Filed: 12/05/2007
• Published: 07/22/2010
• Est. Priority Date: 12/08/2006
• Status: Abandoned Application

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Yonekawa, Masami
• Application Number:
  US12/305,851
• Publication Number:
  US 20100183987A1
• Time in Patent Office: Days
• US Class Current: 430/325
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Abstract

An exposure apparatus for exposing a substrate to radiant energy in a vacuum is disclosed. The apparatus comprises a chamber in which the vacuum is generated, a blowing device including a supply nozzle (17a) located in the chamber and configured to blow, through said supply nozzle, a gas to an object (2) arranged in the chamber in which the vacuum is generated, and a recovery device including a recovery nozzle (17b) located in the chamber and configured to recover, through the recovery nozzle, the gas blown into the chamber through said supply nozzle, wherein the apparatus is configured so that the object moves in a direction opposite to a direction from the supply nozzle to the recover nozzle, parallel to blowing by the blowing device.

Claims

1. An exposure apparatus for exposing a substrate to radiant energy in a vacuum, said apparatus comprising:

a chamber in which the vacuum is generated;

a blowing device including a supply nozzle located in said chamber and configured to blow, through said supply nozzle, a gas to an object arranged in said chamber in which the vacuum is generated; and

a recovery device including a recovery nozzle located in said chamber and configured to recover, through said recovery nozzle, the gas blown into said chamber through said supply nozzle,

wherein said apparatus is configured so that the object moves in a direction opposite to a direction from said supply nozzle to said recovery nozzle, parallel to blowing by said blowing device.

5. An apparatus according to claim 1, wherein a supply port of said supply nozzle extends in one direction.

6. An apparatus according to claim 1, wherein said recovery device includes a grounded electrode and one of a positive electrode and a negative electrode, and the object is grounded.

7. An apparatus according to claim 1, wherein the object includes one of the substrate, a substrate chuck, a reticle, and a reticle chuck.

8. A method of manufacturing a device, said method comprising:

exposing a substrate to radiant energy using an exposure apparatus defined in claim 1;

developing the exposed substrate; and

processing the developed substrate to manufacture the device.

2. An exposure apparatus for exposing a substrate to radiant energy in a vacuum, said apparatus comprising:

a chamber in which the vacuum is generated;

a blowing device including a supply nozzle located in said chamber and configured to blow, through said supply nozzle, a gas to an object arranged in said chamber in which the vacuum is generated;

a recovery device including a recovery nozzle located in said chamber and configured to recover, through said recovery nozzle, the gas blown into said chamber through said supply nozzle; and

an irradiator configured to irradiate the object with a pulse laser light,

wherein said apparatus is configured so that a region on the object, to which said blowing device blows the gas, overlaps a region on the object, which is irradiated with the pulse laser light, and gas blowing by said blowing device and pulse laser light irradiation by said irradiator are performed in synchronism with each other.

3. An exposure apparatus for exposing a substrate to radiant energy in a vacuum, said apparatus comprising:

a chamber in which the vacuum is generated;

a blowing device including a supply nozzle located in said chamber and configured to blow, through said supply nozzle, a gas to an object arranged in said chamber in which the vacuum is generated; and

a recovery device including a recovery nozzle located in said chamber, and recovers, through said recovery nozzle, the gas blown into said chamber through said supply nozzle,

wherein said apparatus is configured so that said blowing device blows a supersonic gas with a shock wave.

4. An exposure apparatus for exposing a substrate to radiant energy in a vacuum, said apparatus comprising:

a chamber in which the vacuum is generated;

a blowing device including a supply nozzle located in said chamber and configured to blow, through said supply nozzle, a gas to an object arranged in said chamber in which the vacuum is generated; and

a recovery device including a recovery nozzle located in said chamber and configured to recover, through said recovery nozzle, the gas blown into said chamber through said supply nozzle,

wherein said apparatus is configured so that a component of the gas blown by said blowing device is sublimated to a solid.