MASK APPLIED TO A WORKPIECE

• US 20100184243A1
• Filed: 01/19/2010
• Published: 07/22/2010
• Est. Priority Date: 01/21/2009
• Status: Active Grant

• Current Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Original Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Inventors: LOW, Russell J., Sinclair, Frank, Blake, Julian G.
• Granted Patent: US 8,153,466 B2
• Time in Patent Office: Days
• US Class Current: 438/57
• CPC Class Codes: C23C 14/042 using masks
• CPC Class Codes: C23C 14/48 Ion implantation
• CPC Class Codes: H01L 31/18 Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

Abstract

A method of fabricating a workpiece is disclosed. A material defining apertures is applied to a workpiece. A species is introduced to the workpiece through the apertures and the material is removed. For example, the material may be evaporated, may form a volatile product with a gas, or may dissolve when exposed to a solvent. The species may be introduced using, for example, ion implantation or gaseous diffusion.

Claims

1. A method of fabricating a workpiece comprising:

applying a material to a workpiece, said material defining a plurality of apertures, wherein said material is selected from the group consisting of wax, carbon dioxide, xenon difluoride, and xenon trifluoride;

introducing a species into said workpiece through said plurality of apertures; and

evaporating said material off said workpiece.

2. The method of claim 1, wherein said introducing is selected from the group consisting of ion implantation and gaseous diffusion.

3. The method of claim 1, wherein said workpiece is a solar cell and said introducing through said plurality of apertures forms a plurality of doped regions.

4. The method of claim 1, further comprising freezing said material.

5. The method of claim 1, further comprising activating said workpiece, wherein said evaporating and said activating occur at least partially simultaneously.

6. A method of fabricating a workpiece comprising:

applying a material to a workpiece, said material defining a plurality of apertures;

introducing a species into said workpiece through said plurality of apertures;

exposing said workpiece to a gas;

forming a volatile product from said material thereby removing said material from said workpiece; and

activating said workpiece, wherein said exposing, said forming, and said activating occur at least partially simultaneously.

7. The method of claim 6, wherein said material is selected from the group consisting of wax, zinc, germanium, and a hydrocarbon.

8. The method of claim 7, wherein said hydrocarbon comprises benzene or butane.

9. The method of claim 6, wherein said gas is selected from the group consisting of O₂, NF₃, and F₂.

10. The method of claim 6, wherein said introducing is selected from the group consisting of ion implantation and gaseous diffusion.

11. The method of claim 6, wherein said workpiece is a solar cell and said introducing through said plurality of apertures forms a plurality of doped regions.

12. The method of claim 6, further comprising freezing said material.

13. A method of fabricating a workpiece comprising:

applying a material to a workpiece, said material defining a plurality of apertures;

introducing a species into said workpiece through said plurality of apertures;

exposing said material to a solvent; and

dissolving said material from said workpiece.

14. The method of claim 13, wherein said material is selected from the group consisting of wax, glycerin, antimony oxide, a hydrocarbon, graphite, and a graphite compound.

15. The method of claim 14, wherein said hydrocarbon comprises benzene or butane.

16. The method of claim 13, wherein said introducing is selected from the group consisting of ion implantation and gaseous diffusion.

17. The method of claim 13, wherein said workpiece is a solar cell and said introducing through said plurality of apertures forms a plurality of doped regions.

18. The method of claim 13, wherein said solvent is selected from the group of water and an organic compound.