Method of Forming Conformal Dielectric Film Having Si-N Bonds by PECVD
First Claim
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1. A method of forming a conformal dielectric film having Si—
- N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD), which comprises;
introducing a nitrogen- and hydrogen-containing reactive gas and an additive gas into a reaction space inside which the semiconductor substrate is placed;
applying RF power to the reaction space; and
introducing a hydrogen-containing silicon precursor in pulses of less than a 5-second duration into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film having Si—
N bonds on the substrate.
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Abstract
A method of forming a conformal dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD) includes: introducing a nitrogen- and hydrogen-containing reactive gas and an additive gas into a reaction space inside which a semiconductor substrate is placed; applying RF power to the reaction space; and introducing a hydrogen-containing silicon precursor in pulses into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film having Si—N bonds on the substrate.
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21 Claims
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1. A method of forming a conformal dielectric film having Si—
- N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD), which comprises;
introducing a nitrogen- and hydrogen-containing reactive gas and an additive gas into a reaction space inside which the semiconductor substrate is placed; applying RF power to the reaction space; and introducing a hydrogen-containing silicon precursor in pulses of less than a 5-second duration into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film having Si—
N bonds on the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
- N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD), which comprises;
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