MULTI-WORKPIECE PROCESSING CHAMBER AND WORKPIECE PROCESSING SYSTEM INCLUDING THE SAME

• US 20100193132A1
• Filed: 04/02/2009
• Published: 08/05/2010
• Est. Priority Date: 07/23/2008
• Status: Abandoned Application

• Current Assignee: New Power Plasma Co., Ltd.
• Original Assignee: New Power Plasma
• Inventors: Nam, Chang Woo, Wi, Soon Im
• Application Number:
  US12/597,924
• Publication Number:
  US 20100193132A1
• Time in Patent Office: Days
• US Class Current: 156/345.51
• CPC Class Codes: H01L 21/6719 characterized by the construction of the processing chambers, e.g. modular processing chambers

Abstract

A multi-workpiece processing chamber according to the present invention comprises a chamber housing which forms at least two internal processing spaces therein; at least one partition member which is provided in the chamber housing and partitions the chamber housing into at least two internal processing spaces; and the respective internal processing spaces being coupled with the partition member and having a symmetric shape to generate a processing reaction uniformly. The multi-workpiece processing chamber according to the present invention has internal processing spaces that have a symmetric shape by being coupled with a partition member. Thus, a processing reaction uniformly occurs across the internal processing areas and reproducibility and uniformity of a workpiece processing process may improve.

Claims

1. A multi-workpiece processing chamber comprising:

a chamber housing which forms at least two internal processing spaces therein;

at least one partition member which is provided in the chamber housing and partitions the chamber housing into at least two internal processing spaces; and

the respective internal processing spaces being coupled with the partition member and having a symmetric shape to generate a processing reaction uniformly.

2. The multi-workpiece processing chamber according to claim 1, wherein the chamber housing comprises a first curved surface which has a predetermined curvature, the partition member comprises a second curved surface which has the same curvature as that of the first curved surface, and the first curved surface and the second curved surface are coupled to each other and form a symmetric circle.

3. The multi-workpiece processing chamber according to claim 1, wherein the chamber housing comprises a plurality of housings which is coupled to each other.

4. The multi-workpiece processing chamber according to claim 3, wherein the chamber housing comprises:

an intermediate housing which has a workpiece supporting station;

an upper housing which is coupled to an upper part of the intermediate housing and forms a first curved surface; and

a lower housing which is coupled to a lower part of the intermediate housing.

5. A multi-workpiece processing system comprising:

at least one multi-workpiece processing chamber which has a plurality of internal processing spaces partitioned by a partition member;

a transfer chamber, in a circumferential area of which is disposed at least one multi-workpiece processing chamber; and

a workpiece transfer unit which is provided in the transfer chamber and transfers a workpiece to the internal processing spaces of the multi-workpiece processing chamber.

6. The multi-workpiece processing system according to claim 5, wherein the internal processing space is coupled with the partition member and has a symmetric shape to generate a uniform reaction.

7. The multi-workpiece processing system according to claim 5, wherein the transfer chamber comprises a polygonal shape, and the multi-workpiece processing chamber is provided in each side of the transfer chamber.

8. The multi-workpiece processing system according to claim 7, wherein the workpiece transfer unit comprises:

a spindle which is rotatably provided, a transfer arm which is coupled to the spindle and is foldable to move between a standby position and a transfer position loading the workpiece to the multi-workpiece processing chamber; and

an end effector unit which is coupled to an end part of the transfer arm and comprises a plurality of end effectors which is respectively provided in a plurality of internal processing spaces of the multi-workpiece processing chamber from the transfer position.

9. The multi-workpiece processing system according to claim 8, wherein the transfer arm is provided to move the end effector unit from the standby position to the central part of the transfer chamber.

10. The multi-workpiece processing system according to claim 9, wherein the end effector unit is rotatably coupled to the transfer arm.

11. The multi-workpiece processing system according to claim 10, wherein the workpiece transfer unit comprises a workpiece transfer unit for loading only which loads the workpiece to the multi workpiece processing chamber and a workpiece transfer unit for unloading only which unloads the workpiece from the multi-workpiece processing chamber.

12. A multi-workpiece processing chamber comprising:

a plurality of internal processing spaces which comprises a workpiece support;

a first gas supply ratio controller which controls a supply ratio of a gas supplied from a gas supply source to the plurality of internal processing spaces; and

a second gas supply ratio controller which is provided between the first gas supply ratio controller and the respective internal processing spaces and divides the gas supplied to the internal processing spaces and supplies gas to at least two divided parts of the internal processing spaces.

13. The multi-workpiece processing chamber according to claim 12, wherein the second gas supply ratio controller divides and supplies a gas to a central part and a circumferential part of the internal processing spaces.

14. The multi-workpiece processing chamber according to claim 13, wherein the second gas supply ratio controller controls a gas supply ratio so that the amount of gas supplied to the central part and the circumferential part differs.

15. The multi-workpiece processing chamber according to claim 12, further comprising:

a common exhaust channel through which a gas is exhausted from the plurality of internal processing spaces; and

a bypass controller which is provided between the first gas supply ratio controller and the second gas supply ratio controller and bypasses a path of the gas supplied to the internal processing spaces to the common exhaust channel.

16. The multi-workpiece processing chamber according to claim 15, wherein the bypass controller comprises:

a first opening/closing valve which is provided between the first gas supply ratio controller and the second gas supply ratio controller and controls whether to supply a gas to the internal processing spaces; and

a second opening/closing valve which is provided between the first gas supply ratio controller and the common exhaust channel and controls whether to supply a gas to the common exhaust channel.