Exposure apparatus, exposure method, and method for producing device
First Claim
1. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space.
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Accused Products
Abstract
A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts. The structure has an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space.
54 Citations
24 Claims
- 1. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space.
- 15. A device manufacturing method comprising projecting a patterned beam of radiation, through an aperture of a structure and a liquid provided in a space adjacent a substrate, onto the substrate, wherein the structure extends substantially parallel to a surface of the substrate, to divide the space into two parts, the structure having a recess at the bottom side of the structure to extract a fluid from the space.
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17. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising:
- a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts and having an aperture to allow transmission of the pattern, and a flow channel in or adjacent the structure to provide a liquid flow substantially parallel to the surface into the space.
- View Dependent Claims (18, 19, 20, 21, 22, 23, 24)
Specification