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Exposure apparatus, exposure method, and method for producing device

  • US 20100195067A1
  • Filed: 04/02/2010
  • Published: 08/05/2010
  • Est. Priority Date: 06/10/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space.

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