CLEANING MEMBER, CLEANING METHOD, AND DEVICE MANUFACTURING METHOD
First Claim
Patent Images
1. A lithographic apparatus comprising:
- a substrate table constructed to hold a substrate;
a recess in the substrate table configured to receive an object; and
a cleaning fluid supply device configured to supply cleaning fluid to at least an outer area of the recess.
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Abstract
A cleaning member is smaller than a substrate for exposure where exposure light is irradiated, and at least part of a substrate-holding member that holds a rear face of the substrate for exposure is held by the substrate-holding member in order to clean.
71 Citations
40 Claims
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1. A lithographic apparatus comprising:
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a substrate table constructed to hold a substrate; a recess in the substrate table configured to receive an object; and a cleaning fluid supply device configured to supply cleaning fluid to at least an outer area of the recess. - View Dependent Claims (2, 3, 4, 5, 6, 8, 9, 10, 11, 12, 13, 14, 15, 16, 18, 19, 20, 21, 22)
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7. (canceled)
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17. (canceled)
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23. An immersion lithographic apparatus comprising:
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a substrate table constructed to hold a substrate; a drain in the substrate table configured to receive an immersion fluid which leaks, in use, into a gap between an edge of the substrate table and an object on the substrate table; and an inlet adjacent an end of an elongate member configured to supply cleaning fluid to (i) the gap, or (ii) an inlet to the drain, or (iii) the drain, or (iv) any combination selected from (i)-(iii). - View Dependent Claims (24, 25, 26, 27, 28, 29, 30)
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31. A method of cleaning at least a part of a recess in a substrate table configured to receive an object, the method comprising:
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providing a cleaning fluid to at least an outer area of the recess; and extracting the cleaning fluid from the recess. - View Dependent Claims (32, 34, 35, 36, 38, 39)
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33. (canceled)
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37. (canceled)
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40. A lithographic projection apparatus comprising:
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a projection system arranged to project a pattern towards a substrate table; a liquid supply system arranged to supply a cleaning fluid to a gap defined between an edge of the substrate table and a substrate when present; and an inlet configured to remove excess fluid, wherein in use the inlet is located in the gap and is connected to an under pressure source so as to remove liquid from the gap.
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Specification