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PROCESS AND TEMPERATURE INSENSITIVE FLICKER NOISE MONITOR CIRCUIT

  • US 20100197053A1
  • Filed: 04/16/2010
  • Published: 08/05/2010
  • Est. Priority Date: 04/02/2008
  • Status: Active Grant
First Claim
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1. A method for monitoring defects in wafers, the method comprising:

  • selecting at least one area on each one of the wafers to fabricate a monitoring circuit, wherein the monitoring circuit includes representative devices to replicate similar devices located in a die area of the wafers;

    measuring a differential signal generated by selected ones of the representative devices located on each one of the wafers, the differential signal being indicative of a noise caused by the defects present in the selected ones; and

    digitizing the differential signal to provide a digital signal, the digitizing being performed by the monitoring circuit.

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