OPTICAL APPARATUS FOR PLASMA

• US 20100200767A1
• Filed: 12/18/2009
• Published: 08/12/2010
• Est. Priority Date: 02/10/2009
• Status: Active Grant

• Current Assignee: Industry Academic Cooperation Foundation, Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: YI, HunJung, CHAE, Seungki, OH, Chang-Hoon, HAHN, Jae-Won
• Granted Patent: US 8,416,509 B2
• Time in Patent Office: Days
• US Class Current: 250/423.R
• CPC Class Codes: G01J 3/02 Details
• CPC Class Codes: G01J 3/0208 using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
• CPC Class Codes: G01J 3/0229 using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
• CPC Class Codes: G01J 3/0262 Constructional arrangements for removing stray light
• CPC Class Codes: G01J 3/0289 Field-of-view determination; Aiming or pointing of a spectrometer; Adjusting alignment; Encoding angular position; Size of measurement area; Position tracking
• CPC Class Codes: G01J 3/443 Emission spectrometry
• CPC Class Codes: G02B 21/0028 specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes

Abstract

An optical apparatus for plasma includes a light collection lens provided to receive optical emission spectrum from plasma, a first aperture stop disposed between the light collection lens and the plasma to block out-focused light, a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light, and a pinhole disposed at the imaging area of the light collection lens to limit depth of focus.

Claims

1. An optical apparatus for plasma, comprising:

a light collection lens provided to receive optical emission spectrum from plasma;

a first aperture stop disposed between the light collection lens and the plasma to block out-focused light;

a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light; and

a pinhole disposed at the imaging area of the light collection lens to limit depth of focus.

2. The optical apparatus of claim 1, wherein a distance between the pinhole and the light collection lens is variable.

3. The optical apparatus of claim 1, wherein a distance between the first aperture stop and the light collection lens is fixed.

4. The optical apparatus of claim 1, further comprising:

an accumulated light source removing unit disposed at a back-end of the pinhole.

5. The optical apparatus of claim 4, wherein the accumulated light source removing unit comprises:

a first lens;

a second lens; and

an aperture stop disposed between the first lens and the second lens.

6. The optical apparatus of claim 4, further comprising:

a light transmitting unit configured to transmit light passing the accumulated light source removing unit to a predetermined position after receiving the light;

a spectrum unit configured to measure an intensity of output light received from the light transmitting unit according to wavelength; and

a control unit configured to receive and process an output signal of the spectrum unit.

7. The optical apparatus of claim 1, further comprising:

an align unit disposed between the second aperture stop and the pinhole to determine whether the second aperture stop and the pinhole are aligned with each other by changing a path of light passing the light collection lens.

8. The optical apparatus of claim 1, wherein the align unit comprises:

a movable mirror provided to change a path of light passing the second aperture stop;

a reticle provided to confirm a position of light reflected from the mirror;

an align lens provided to concentrate light passing the reticle; and

a sensing unit provided to receive light passing the align lens.

9. The optical apparatus of claim 1, further comprising:

a frame where the light collection lens, the first aperture stop, the second aperture stop, and the pinhole are mounted, and wherein the frame being provided to vary a distance between the light collection lens and the plasma.

10. The optical apparatus of claim 1, further comprising:

a lens transporting unit where the light collection lens and the first aperture stop are mounted, and wherein the lens transporting unit being provided to adjust a distance between the light collection lens and the pinhole.

11. An optical apparatus comprising:

a light collecting lens;

a plasma generator comprising a chamber, an energy applying means and a window, wherein the light collecting lens is configured to receive an optical emission spectrum emitted from an object area through the window of the plasma generator;

a first aperture stop disposed between the light collection lens and the window to block out-focused light;

a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light;

a pinhole disposed at an imaging area of the light collecting lens to limit depth of focus (DOF) of the object area;

an accumulated light source removing unit disposed at a back-end of the pinhole;

a light transmitting unit disposed at a back-end of the accumulated light source removing unit, wherein the accumulated light source removing unit concentrates and transmits the light passing the pinhole to the light transmitting unit;

a spectrum unit configured to measure an intensity of output light received from the light transmitting unit according to wavelength;

a control unit configured to receive an output signal of the spectrum unit to process the received signal;

an align unit disposed between the second aperture stop and the pinhole to change a path of light passing the light collection lens;

a frame including movable means, wherein the light collection lens, the first aperture stop, the second aperture stop and the pin hole are mounted on the frame; and

a lens transporting unit mounted on the frame.

12. The optical apparatus of claim 11, wherein the plasma generator further comprises a substrate holder and a substrate disposed on the substrate holder.

13. The optical apparatus of claim 11, wherein the window of the plasma generator allows rays to transmit ultraviolet, infrared or visible ray band and wherein the window is made of glass or quartz.

14. The optical apparatus of claim 11, wherein the window is disposed at a side surface of the chamber.

15. The optical apparatus of claim 11, wherein the window is disposed at a top surface of the chamber or an exhaust unit of the chamber.

16. The optical apparatus of claim 11, wherein the window is anti-reflectively coated and has a constant transmittance according to wavelength.

17. The optical apparatus of claim 11, wherein the accumulated light source removing unit includes a first lens, a second lens, and an aperture stop disposed between the first and second lenses.

18. The optical apparatus of claim 17, wherein the focus of the first lens matches a position of the pinhole, wherein the first lens is configured to output parallel light, wherein the second lens is configured to receive parallel light and concentrates the received light on the focus of the second lens, and wherein the aperture stop is configured to remove light passing the pinhole at an off-axis light source.

19. The optical apparatus of claim 11, wherein the align unit includes a mirror which is configured to change a path of light passing the second aperture stop, a reticle configured to check a position of light reflected from the mirror, an align lens configured to concentrate light passing the reticle, and a sensing unit configured to detect light passing the align lens.

20. The optical apparatus of claim 11, wherein the lens transporting unit is provided to adjust a distance between the light collection lens and the pinhole.