RADIATION SYSTEM WITH CONTAMINATION BARRIER

• US 20100200772A1
• Filed: 04/30/2010
• Published: 08/12/2010
• Est. Priority Date: 12/23/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Freriks, Johannes Maria, Box, Wilhelmus Josephus, Vijfvinkel, Jakob, BAKKER, Levinus Pieter, Dierichs, Marcel Mathijs Theodore Marie, Schuurmans, Frank Jeroen Pieter
• Granted Patent: US 8,129,702 B2
• Time in Patent Office: Days
• US Class Current: 250/492.100
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70166 Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Claims

1. A radiation system comprising:

a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source, the contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material; and

a collector configured to collect radiation from the contamination barrier, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas.

2. A lithographic projection apparatus comprising:

a radiation system to form a beam of radiation, the radiation system comprising;

a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source, the contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material, and

a collector configured to collect radiation from the contamination barrier, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas;

a support structure to support a patterning structure to be irradiated by a beam of radiation to pattern the beam of radiation;

a substrate support to support a substrate; and

a projection system to image an irradiated portion of the patterning structure onto a target portion of the substrate.

3. A method of manufacturing a device by a lithographic process, the method comprising:

passing radiation from a radiation source through a contamination barrier comprising a plurality of lamellas, the surface of the lamellas comprising a material and the contamination barrier capturing debris from the radiation source;

collecting radiation from the contamination barrier with a collector, an optical surface of the collector comprising a material that is the same as the material of the surface of the lamellas;

patterning radiation from the collector; and

projecting the patterned radiation onto a target portion of a substrate.