CALIBRATION METHOD FOR OPTICAL METROLOGY

• US 20100201981A1
• Filed: 02/12/2009
• Published: 08/12/2010
• Est. Priority Date: 02/12/2009
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: STANKE, Fred, Tuitje, Holger, Norton, Adam
• Granted Patent: US 7,924,422 B2
• Time in Patent Office: Days
• US Class Current: 356/328
• CPC Class Codes: G01B 2210/56 Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
• CPC Class Codes: G01J 2003/1828 with order sorter or prefilter
• CPC Class Codes: G01J 3/02 Details
• CPC Class Codes: G01J 3/0205 Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
• CPC Class Codes: G01J 3/0224 using polarising or depolarising elements
• CPC Class Codes: G01J 3/0297 Constructional arrangements for removing other types of optical noise or for performing calibration
• CPC Class Codes: G01J 3/28 Investigating the spectrum using colour filters G01J3/51
• CPC Class Codes: G01J 3/2803 using photoelectric array detector
• CPC Class Codes: G01N 21/274 Calibration, base line adjustment, drift correction

Abstract

A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.

Claims

1. A method for wavelength to pixel location calibration of a spectrometer of an optical metrology system, comprising:

providing an optical metrology system, comprising;

a spectrometer having an array detector with pixel locations defined thereupon, for measuring diffraction spectra;

an order sorting filter with at least two zones created thereon, each pair of adjacent zones of the order sorting filter defining zone joints therebetween,

providing at least one metrology sample with known reflectance versus wavelength data,

measuring the reflectance of the at least one metrology sample using the optical metrology system,

defining a wavelength to pixel location calibration curve as a set of curves comprising;

at least one first function of array detector pixel location that defines a portion of the wavelength to pixel location calibration curve affected by dispersion at an order sorting filter zone joint, the at least one first function containing adjustable fit coefficients; and

at least two second functions of array detector pixel location that define portions of the wavelength to pixel location calibration curve not affected by dispersion at an order sorting filter zone joint, the at least two second functions containing adjustable fit coefficients,

iteratively fitting adjustable fit coefficients of the at least one first function and the at least two second functions defining the wavelength to pixel location calibration curve to the measured reflectance data of the at least one metrology sample, and

utilizing the fitted wavelength to pixel location calibration curve in subsequent measurement of diffraction spectra.

2. The method of claim 1, wherein a pixel intensity calibration is performed concurrently during the step of iteratively fitting adjustable fit coefficients.

3. The method of claim 1, wherein the at least two second functions are polynomials of array detector pixel location of order in the range of 3 to 4.

4. The method of claim 1, wherein the at least two second functions are non-polynomial mathematical functions.

5. The method of claim 1, wherein the at least two second functions are series of non-polynomial mathematical functions.

6. The method of claim 1, wherein the at least two second functions are represented by lookup tables containing pixel location-wavelength data pairs.

7. The method of claim 1, wherein the at least one first function of array detector pixel location is a polynomial of order in the range of 2 to 10.

8. The method of claim 1, wherein the at least one first function of array detector pixel location is a polynomial of order in the range of 2 to 6.

9. The method of claim 1, wherein the at least one first function of array detector pixel location is a polynomial of order in the range of 2 to 4.

10. The method of claim 1, wherein the at least one first function of array detector pixel location is a non-polynomial mathematical function.

11. The method of claim 10, wherein the at least one first function of array detector pixel location is a Gaussian.

12. The method of claim 10, wherein the at least one first function of array detector pixel location is a generalized exponential function.

13. The method of claim 1, wherein the at least one first function of array detector pixel location is a series of non-polynomial mathematical functions.

14. The method of claim 13, wherein the at least one first function of array detector pixel location is a series of Gaussians.

15. The method of claim 13, wherein the at least one first function of array detector pixel location is a series of generalized exponential functions.

16. The method of claim 1, wherein the at least one first function of array detector pixel location is represented by a lookup table containing pixel location-wavelength data pairs.