GAS PURIFICATION METHOD

• US 20100206164A1
• Filed: 10/09/2008
• Published: 08/19/2010
• Est. Priority Date: 10/12/2007
• Status: Active Grant

• Current Assignee: National Institute of Advanced Industrial Science and Technology (Government of Japan), Taiyo Nippon Sanso Corporation (Mitsubishi Chemical Group Corp.)
• Original Assignee: National Institute of Advanced Industrial Science and Technology (Government of Japan), Taiyo Nippon Sanso Corporation (Mitsubishi Chemical Group Corp.)
• Inventors: Miyazawa, Yuzuru, Haraya, Kenji, Yoshimune, Miki, Kobayashi, Yoshihiko
• Granted Patent: US 8,357,228 B2
• Time in Patent Office: Days
• US Class Current: 95/48
• CPC Class Codes: B01D 2257/20 Halogens or halogen compounds
• CPC Class Codes: B01D 2258/0216 from CVD treatment or semi-conductor manufacturing
• CPC Class Codes: B01D 53/22 by diffusion manufacturing semi-permeable membranes B01D67/00; form, structure or properties of semi-permeable membranes B01D69/00; material for semi-permeable membranes B01D71/00
• CPC Class Codes: B01D 53/228 characterised by specific membranes
• CPC Class Codes: B01D 63/02 Hollow fibre modules
• CPC Class Codes: B01D 71/021 Carbon
• CPC Class Codes: C01B 2203/0405 Purification by membrane separation
• CPC Class Codes: C01B 2210/0045 Oxygen
• CPC Class Codes: C01B 2210/0051 Carbon dioxide
• CPC Class Codes: C01B 2210/0062 Water
• CPC Class Codes: C01B 3/04 by decomposition of inorganic compounds, e.g. ammonia C01B3/0005 takes precedence
• CPC Class Codes: C01B 3/503 characterised by the membrane
• CPC Class Codes: C01B 7/00 Halogens; Halogen acids oxyacids C01B11/00
• CPC Class Codes: C01C 1/024 Purification
• CPC Class Codes: Y02E 60/36 Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

Abstract

A gas purification method of the present invention uses a carbon membrane having a molecular sieving action to purify at least one selected from the group consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing an impurity at 10 ppm or less. The present invention can be used for a recovery unit that recoveries a used gas to reuse it as an ultrapure semiconductor material gas, and a unit or equipment that produces or charges an ultrapure semiconductor material gas.

Claims

1. A gas purification method which uses a carbon membrane having a molecular sieving action to purify at least one selected from the group consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing an impurity at 10 ppm or less.

2. A gas purification method, wherein the carbon membrane is in a hollow fiber shape or a pipe shape.