Semiconductor light emitting device and method of manufacturing the same

• US 20100207147A1
• Filed: 02/16/2010
• Published: 08/19/2010
• Est. Priority Date: 02/17/2009
• Status: Abandoned Application

• Current Assignee: LG Innotek Company Limited (LG Corporation)
• Original Assignee: LG Innotek Company Limited (LG Corporation)
• Inventors: Kim, Sung Kyoon
• Application Number:
  US12/656,738
• Publication Number:
  US 20100207147A1
• Time in Patent Office: Days
• US Class Current: 257/98
• CPC Class Codes: H01L 33/22 Roughened surfaces, e.g. at the interface between epitaxial layers
• CPC Class Codes: H01L 33/32 containing nitrogen
• CPC Class Codes: H01L 33/42 Transparent materials

Abstract

Disclosed is a semiconductor light emitting device. The semiconductor light emitting device includes a first conductive semiconductor layer; an active layer on the first conductive semiconductor layer; and a second conductive semiconductor layer on the active layer, in which a patterned roughness is formed on a top surface of the second conductive semiconductor layer.

Claims

1. A semiconductor light emitting device comprising:

a first conductive semiconductor layer;

an active layer on the first conductive semiconductor layer; and

a second conductive semiconductor layer on the active layer, in which a patterned roughness is formed on a top surface of the second conductive semiconductor layer.

2. The semiconductor light emitting device of claim 1, wherein the patterned roughness comprises a height of 0.1 to 20 nm and a pitch of 0.1 to 20 nm.

3. The semiconductor light emitting device of claim 1, further comprising a third conductive semiconductor layer disposed on the second conductive semiconductor layer along the patterned roughness.

4. The semiconductor light emitting device of claim 1, further comprising a transparent electrode layer disposed on the second conductive semiconductor layer along the patterned roughness.

5. The semiconductor light emitting device of claim 4, wherein the transparent electrode layer comprises at least one selected from the group consisting of ITO (indium tin oxide), IZO (indium zinc oxide), IZTO (indium zinc tin oxide), IAZO (indium aluminum zinc oxide), IGZO (indium gallium zinc oxide), IGTO(indium gallium tin oxide), AZO (aluminum zinc oxide), ATO (antimony tin oxide), IrOx, RuOx, RuOx/ITO, Ni/IrOx/Au, and Ni/IrOx/Au/ITO.

6. The semiconductor light emitting device of claim 1, wherein the patterned roughness comprises a conical shape.

7. A method of manufacturing a semiconductor light emitting device, the method comprising:

depositing a first conductive semiconductor layer, an. active layer, and a second conductive semiconductor layer;

forming a metal layer on the second conductive semiconductor layer;

forming a metal dot layer by a heat treatment to the metal layer; and

etching the metal dot layer to form a patterned roughness having a nano-size on a surface of the second conductive semiconductor layer.

8. The method of claim 7, wherein the etching the metal dot layer is performed by irradiating a laser.

9. The method of claim 8, wherein the laser includes excimer laser.

10. The method of claim 7, wherein the metal layer comprises at least one selected from the group consisting of Ni, Cr, Ag, Ti, Al, Pt, Au, and an alloy thereof.

11. The method of claim 7, wherein the patterned roughness comprises a height of 0.1 to 20 nm and a pitch of 0.1 to 20 nm.

12. The method of claim 7, further comprising forming a third conductive semiconductor layer on the second conductive semiconductor layer along the patterned roughness.

13. The method of claim 7, further comprising forming a transparent electrode layer on the second conductive semiconductor layer along the patterned roughness.

14. The method of claim 13, wherein the transparent electrode layer comprises at least one selected from the group consisting of ITO (indium tin oxide), IZO (indium zinc oxide), IZTO (indium zinc tin oxide), IAZO (indium aluminum zinc oxide), IGZO (indium gallium zinc oxide), IGTO(indium gallium tin oxide), AZO (aluminum zinc oxide), ATO (antimony tin oxide), IrOx, RuOx, RuOx/ITO, Ni/IrOx/Au, and Ni/IrOx/Au/ITO.

15. The method of claim 7, wherein the patterned roughness comprises a conical shape.