SURFACE EMITTING SEMICONDUCTOR LASER AND METHOD FOR FABRICATING THE SAME
First Claim
1. A surface emitting semiconductor laser comprising:
- a substrate;
a first semiconductor multilayer reflection mirror of a first conduction type that is formed on the substrate and includes pairs of semiconductor layers having different Al compositions;
an active region formed on the first semiconductor multilayer reflection mirror;
a second semiconductor multilayer reflection mirror of a second conduction type opposite to the first conduction type, the second semiconductor multilayer reflection mirror being formed on the active region and including pairs of semiconductor layers having different Al compositions;
a first selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a first oxidized region selectively oxidized, and a first conductive region surrounded by the first oxidized region, the first selectively oxidized layer including AlAs; and
a second selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a second oxidized region selectively oxidized, and a second conductive region surrounded by the second oxidized region, the second selectively oxidized layer including AlAs,a first semiconductor layer next to the first selectively oxidized layer having an Al composition greater than that of a second semiconductor layer next to the second selectively oxidized layer, andthe first conductive region having a size smaller than that of the second conductive region.
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Accused Products
Abstract
A surface emitting semiconductor laser includes: a substrate; a first semiconductor multilayer reflection mirror of a first conduction type; an active region; a second semiconductor multilayer reflection mirror of a second conduction type; a first selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a first oxidized region selectively oxidized, and a first conductive region surrounded by the first oxidized region; and a second selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a second oxidized region selectively oxidized, and a second conductive region surrounded by the second oxidized region. A first semiconductor layer next to the first selectively oxidized layer has an Al composition greater than that of a second semiconductor layer next to the second selectively oxidized layer, the first conductive region having a size smaller than that of the second conductive region.
14 Citations
7 Claims
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1. A surface emitting semiconductor laser comprising:
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a substrate; a first semiconductor multilayer reflection mirror of a first conduction type that is formed on the substrate and includes pairs of semiconductor layers having different Al compositions; an active region formed on the first semiconductor multilayer reflection mirror; a second semiconductor multilayer reflection mirror of a second conduction type opposite to the first conduction type, the second semiconductor multilayer reflection mirror being formed on the active region and including pairs of semiconductor layers having different Al compositions; a first selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a first oxidized region selectively oxidized, and a first conductive region surrounded by the first oxidized region, the first selectively oxidized layer including AlAs; and a second selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a second oxidized region selectively oxidized, and a second conductive region surrounded by the second oxidized region, the second selectively oxidized layer including AlAs, a first semiconductor layer next to the first selectively oxidized layer having an Al composition greater than that of a second semiconductor layer next to the second selectively oxidized layer, and the first conductive region having a size smaller than that of the second conductive region. - View Dependent Claims (2, 3, 4, 5)
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6. A method for fabricating a surface emitting semiconductor laser comprising:
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forming a first semiconductor multilayer reflection mirror of a first conduction type that is formed on a substrate and includes pairs of semiconductor layers having different Al compositions; forming an active region formed on the first semiconductor multilayer reflection mirror; forming a second semiconductor multilayer reflection mirror of a second conduction type opposite to the first conduction type, the second semiconductor multilayer reflection mirror being formed on the active region and including pairs of semiconductor layers having different Al compositions; forming a first selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a first oxidized region selectively oxidized, and a first conductive region surrounded by the first oxidized region, the first selectively oxidized layer including AlAs; and forming a second selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a second oxidized region selectively oxidized, and a second conductive region surrounded by the second oxidized region, the second selectively oxidized layer including AlAs, a first semiconductor layer next to the first selectively oxidized layer having an Al composition greater than that of a second semiconductor layer next to the second selectively oxidized layer, and the first conductive region having a size smaller than that of the second conductive region.
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7. An optical semiconductor device comprising;
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a surface emitting semiconductor laser; and an optical system coupled with the surface emitting semiconductor laser, the surface emitting semiconductor laser including;
a substrate;a first semiconductor multilayer reflection mirror of a first conduction type that is formed on the substrate and includes pairs of semiconductor layers having different Al compositions; an active region formed on the first semiconductor multilayer reflection mirror; a second semiconductor multilayer reflection mirror of a second conduction type opposite to the first conduction type, the second semiconductor multilayer reflection mirror being formed on the active region and including pairs of semiconductor layers having different Al compositions; a first selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a first oxidized region selectively oxidized, and a first conductive region surrounded by the first oxidized region, the first selectively oxidized layer including AlAs; and a second selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a second oxidized region selectively oxidized, and a second conductive region surrounded by the second oxidized region, the second selectively oxidized layer including AlAs, a first semiconductor layer next to the first selectively oxidized layer having an Al composition greater than that of a second semiconductor layer next to the second selectively oxidized layer, and the first conductive region having a size smaller than that of the second conductive region.
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Specification