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Web Substrate Deposition System

  • US 20100221426A1
  • Filed: 03/02/2009
  • Published: 09/02/2010
  • Est. Priority Date: 03/02/2009
  • Status: Abandoned Application
First Claim
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1. A web substrate atomic layer deposition system comprising:

  • a) at least one roller that transports a first surface of a web substrate through processing chambers in a first direction; and

    b) a plurality of processing chambers positioned so that the at least one roller transports the first surface of the web substrate through the plurality of processing chamber in the first direction, the plurality of processing chambers comprising a first precursor reaction chamber that exposes the first surface of the web substrate to a desired partial pressure of first precursor gas, thereby forming a first layer on the first surface of the web substrate, a purging chamber that purges the first surface of the web substrate with a purge gas, a vacuum chamber that removes gas from the first surface of the substrate, and a second precursor reaction chamber that exposes the first surface of the web substrate to a desired partial pressure of the second precursor gas, thereby forming a second layer on the first surface of the web substrate.

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