Web Substrate Deposition System
First Claim
1. A web substrate atomic layer deposition system comprising:
- a) at least one roller that transports a first surface of a web substrate through processing chambers in a first direction; and
b) a plurality of processing chambers positioned so that the at least one roller transports the first surface of the web substrate through the plurality of processing chamber in the first direction, the plurality of processing chambers comprising a first precursor reaction chamber that exposes the first surface of the web substrate to a desired partial pressure of first precursor gas, thereby forming a first layer on the first surface of the web substrate, a purging chamber that purges the first surface of the web substrate with a purge gas, a vacuum chamber that removes gas from the first surface of the substrate, and a second precursor reaction chamber that exposes the first surface of the web substrate to a desired partial pressure of the second precursor gas, thereby forming a second layer on the first surface of the web substrate.
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0 Petitions
Accused Products
Abstract
A web substrate atomic layer deposition system includes at least one roller that transports a surface of a web substrate through a plurality of processing chambers. The plurality of processing chambers includes a first precursor reaction chamber that exposes the surface of the web substrate to a desired partial pressure of first precursor gas, thereby forming a first layer on the surface of the web substrate. A purging chamber purges the surface of the web substrate with a purge gas. A vacuum chamber removes gas from the surface of the substrate. A second precursor reaction chamber exposes the surface of the web substrate to a desired partial pressure of the second precursor gas, thereby forming a second layer on the surface of the web substrate.
70 Citations
34 Claims
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1. A web substrate atomic layer deposition system comprising:
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a) at least one roller that transports a first surface of a web substrate through processing chambers in a first direction; and b) a plurality of processing chambers positioned so that the at least one roller transports the first surface of the web substrate through the plurality of processing chamber in the first direction, the plurality of processing chambers comprising a first precursor reaction chamber that exposes the first surface of the web substrate to a desired partial pressure of first precursor gas, thereby forming a first layer on the first surface of the web substrate, a purging chamber that purges the first surface of the web substrate with a purge gas, a vacuum chamber that removes gas from the first surface of the substrate, and a second precursor reaction chamber that exposes the first surface of the web substrate to a desired partial pressure of the second precursor gas, thereby forming a second layer on the first surface of the web substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A web substrate atomic layer deposition system comprising:
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a) at least one roller that transports a first surface of a web substrate through processing chambers in a first direction; and b) a plurality of processing chambers positioned so that the at least one roller transports the first surface of the web substrate in the first direction through the plurality of processing chamber, the plurality of processing chambers comprising; i) a purging chamber coupled to a purge gas source, the purging chamber purging the first surface of the web substrate with the purge gas as it transports through the purging chamber; ii) a vacuum chamber being coupled a vacuum pump, the vacuum chamber evacuating the first surface of the web substrate as it transports through the vacuum chamber, thereby removing gas from the first surface of the substrate; iii) a first precursor reaction chamber coupled to a first precursor gas source, the first precursor reaction chamber exposing the first surface of the web substrate to a desired partial pressure of the first precursor gas, thereby forming a first layer on the surface of the web substrate; iv) a second purging chamber coupled to a purge gas source, the second purging chamber purging the first surface of the web substrate with the purge gas as it transports through the purging chamber; v) a second vacuum chamber coupled a vacuum pump, the second vacuum chamber evacuating the first surface of the web substrate as it transports through the vacuum chamber, thereby removing gas from the first surface of the substrate; and vi) a second precursor reaction chamber coupled to a second precursor gas source, the second precursor reaction chamber exposing the first surface of the web substrate to a desired partial pressure of the second precursor gas, thereby forming a second layer on the surface of the web substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A method of depositing material on a web substrate, the method comprising:
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a) transporting a surface of a web substrate through a purging chamber that purges the surface of the web substrate with the purge gas; b) transporting the surface of the web substrate through a vacuum chamber that evacuates the surface of the web; c) transporting the surface of the web substrate through a first precursor reaction chamber that exposes the surface of the web substrate to a desired partial pressure of the first precursor gas, thereby forming a first layer on the surface of the web substrate; d) transporting the surface of the web substrate through a second purging chamber that purges the first precursor gas and gas by-products from the surface of the web substrate with the purge gas; e) transporting the surface of the web substrate through a second vacuum chamber that evacuates the surface of the web; and f) transporting the surface of the web substrate through a second precursor reaction chamber that exposes the surface of the web substrate to a desired partial pressure of the second precursor gas, thereby forming a second layer on the surface of the web substrate. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34)
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Specification