PLASMA GENERATING APPARATUS, PLASMA GENERATING METHOD AND REMOTE PLASMA PROCESSING APPARATUS

• US 20100224324A1
• Filed: 03/12/2010
• Published: 09/09/2010
• Est. Priority Date: 02/14/2003
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: KASAI, Shigeru
• Application Number:
  US12/723,075
• Publication Number:
  US 20100224324A1
• Time in Patent Office: Days
• US Class Current: 156/345.360
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence
• CPC Class Codes: H01J 37/3222 Antennas

Abstract

A compact plasma generating apparatus providing high efficiency of plasma excitation is presented. A plasma generating apparatus (100) comprises a microwave generating apparatus (10) for generating microwaves, a coaxial waveguide (20) having a coaxial structure comprising an inner tube (20a) and an outer tube (20b), a monopole antenna (21) being attached to one end of said inner tube (20a), for directing the microwaves generated by said microwave generating apparatus (10) to the monopole antenna (21), a resonator (22) composed of dielectric material for holding the monopole antenna (21), and a chamber (23) in which a specific process gas is fed for plasma excitation. The chamber (23) has an open surface and the resonator (22) is placed on this open surface, and the process gas is excited by the microwaves radiated from the monopole antenna (21) through the resonator (22) into the interior of the chamber (23) to generate plasma.

Claims

1-17. -17. (canceled)

18. A plasma generating apparatus comprising:

a microwave generating apparatus for generating microwaves with a predetermined wavelength;

a coaxial waveguide having a coaxial structure comprising an inner tube and an outer tube, an antenna being attached to one end of said inner tube, for directing the microwaves generated by said microwave generating apparatus to said antenna;

a resonator composed of dielectric material for holding said antenna; and

a chamber in which a specific process gas is fed for plasma excitation, said chamber having an open surface, said resonator being placed on said open surface,

wherein said process gas is excited by the microwaves radiated from said antenna through said resonator into the interior of said chamber, and

wherein said antenna is a slot antenna.

19. A plasma generating apparatus according to claim 18, wherein, when λ

a is a wavelength of the microwaves generated by said microwave generating apparatus, ∈

r is a relative dielectric constant of said resonator, and λ

g is a wavelength of the microwaves inside said resonator obtained by dividing said wavelength λ

a by the square root of said relative dielectric constant ∈

r (λ

g=λ

a/∈

r^1/2), said resonator has a thickness of 25%-45% of said wavelength λ

g.

20. A plasma generating apparatus according to claim 18, wherein said microwave generating apparatus has a microwave power source, an amplifier for regulating output power of the microwaves which are output from said microwave power source, and an isolator for absorbing reflected microwaves which are returning to said amplifier after being output from said amplifier.

21. A plasma generating apparatus according to claim 18, comprising a plurality of said coaxial waveguides and said antenna, wherein said microwave generating apparatus has a microwave power source, a distributor for distributing the microwaves generated by said microwave power source to each said coaxial waveguide and said antenna, a plurality of amplifiers for regulating output power of microwaves respectively which are output from said distributor, and a plurality of isolators for absorbing reflected microwaves which are returning to said plurality of amplifiers after being output from said plurality of amplifiers.

22. A plasma generating apparatus according to claim 21, further comprising a plasma control device for controlling said microwave generating apparatus, wherein microwaves are radiated from one or some of said plurality of antennas through said resonator into the interior of said chamber to excite said process gas and, after the plasma generation, microwaves are radiated from all of said plurality of antennas through said resonator into the interior of said chamber.

23. A plasma generating apparatus according to claim 18, wherein said resonator is composed of either quartz-type material, single-crystal-alumina-type material, polycrystalline-alumina-type material or aluminum-nitride-type material.

24. A plasma generating apparatus according to claim 18, wherein a corrosion protection member composed of quartz-type material, single-crystal-alumina-type material or polycrystalline-alumina-type material is applied on the inner surface of said chamber to prevent corrosion of said chamber.

25. A plasma generating apparatus according to claim 18, wherein said chamber has a jacket structure with cooling ability by flowing a coolant in the interior of the members constituting said chamber.

26. A plasma generating apparatus according to claim 18, wherein said chamber is a base-enclosed cylindrical member and has said open surface at one end, said base-enclosed cylindrical member having an exhaust vent in the bottom wall to discharge the gas excited by microwaves outwardly from said chamber and a gas discharge opening in the proximity of the open surface side of the side wall to discharge said process gas to the interior space.

27. A plasma generating apparatus according to claim 18, wherein a slug tuner that is slidable in a longitudinal direction of said coaxial waveguide is attached to said coaxial waveguide to perform impedance matching for said antenna.

28. A remote plasma processing apparatus having a plasma generating apparatus according to claim 18 comprising:

a substrate processing chamber for accommodating a substrate and providing specific processing to said substrate by the excited gas generated by exciting said process gas in said plasma generating apparatus.