×

Lithographic Apparatus and Device Manufacturing Method

  • US 20100225892A1
  • Filed: 05/25/2010
  • Published: 09/09/2010
  • Est. Priority Date: 12/28/2004
  • Status: Abandoned Application
First Claim
Patent Images

1. A lithographic apparatus comprising:

  • an array of individually controllable elements configured to provide a patterned radiation beam; and

    a projection system configured to project the patterned radiation beam onto a target portion of a substrate, the projection system comprising;

    an array of lenses arranged in a plane, such that each lens in the array of lenses is configured to transmit a different part of the patterned beam, andan actuator system configured to change a location of at least one lens with respect to other lenses such that the array of lenses is at least partially deformed from an original position such that the at least partial deformation is within the plane of the array of lenses.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×