Lithographic Apparatus and Device Manufacturing Method

• US 20100225892A1
• Filed: 05/25/2010
• Published: 09/09/2010
• Est. Priority Date: 12/28/2004
• Status: Abandoned Application

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoogenraad, Johannes Herman
• Application Number:
  US12/787,069
• Publication Number:
  US 20100225892A1
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A lithographic apparatus has an array of individually controllable elements to impart a projection beam with a pattern in its cross-section. The projection system includes an array of lenses arranged in a plane and an actuator configured to change the location of at least one lens of the array of lenses such that the array of lenses is at least partially deformed where the at least partial deformation is within the plane of the array of lenses.

Claims

1. A lithographic apparatus comprising:

an array of individually controllable elements configured to provide a patterned radiation beam; and

a projection system configured to project the patterned radiation beam onto a target portion of a substrate, the projection system comprising;

an array of lenses arranged in a plane, such that each lens in the array of lenses is configured to transmit a different part of the patterned beam, and

an actuator system configured to change a location of at least one lens with respect to other lenses such that the array of lenses is at least partially deformed from an original position such that the at least partial deformation is within the plane of the array of lenses.

2. The apparatus of claim 1, wherein the actuator system comprises a plurality of actuators.

3. The apparatus of claim 1, wherein the actuator system comprises at least one piezoelectric actuator.

4. The apparatus of claim 1, further comprising:

a substrate surface location detector,

wherein the actuator system is configured to adjust the shape of the array of lenses based on the location of a detected substrate surface.

5. The apparatus of claim 1, wherein the array of individually controllable elements comprises an emitting portion configured to emit the patterned radiation beam.

6. A lithographic method, comprising:

providing a patterned radiation beam;

projecting the patterned radiation beam onto a target portion of a substrate using at least an array of lenses arranged in a plane, such that each lens in the array of lenses transmits a different part of the patterned radiation beam; and

changing a location of at least one lens with respect to other lenses in the array of lenses such that the array of lenses is at least partially deformed from an original position such that the at least partial deformation is within the plane of the array of lenses.

7. The method of claim 6, further comprising:

detecting changes in the location of a substrate surface which is used to adjust an overall shape of the array of lenses.

8. A lithographic apparatus comprising:

a system configured to direct a patterned beam onto a target portion of a substrate; and

a substrate surface location detector configured to detect a configuration of surface of the substrate and to produce a signal based thereon,

wherein the system comprises;

lenses arranged in a plane, such that each of the lenses is configured to transmit a different portion of the patterned beam, and

an actuator system configured to receive the signal and to change a location of at least one of the lenses with respect to other ones of the lenses based on the signal, such that the lenses are at least partially deformed from an original configuration,

wherein the actuator system is configured to change the location of a first one of the lenses relative to a second one of the lenses, such that the at least partial deformation is within the plane of the lenses.

9. The apparatus of claim 8, wherein the actuator system comprises a plurality of actuators.

10. The apparatus of claim 8, wherein the actuator system comprises at least one piezoelectric actuator.

11. The apparatus of claim 8, wherein the patterning device comprises an emitting portion configured to emit the patterned beam.

12. A lithographic method, comprising:

providing a patterned radiation beam;

projecting the patterned radiation beam onto a target portion of a substrate using lenses arranged in a plane, such that each of the lenses transmits a different portion of the patterned radiation beam; and

changing a location of a first one of the lenses with respect to a second one of the lenses, such that the lenses are at least partially deformed from an original position,

wherein an actuator system is configured to change the location of the first one of the lenses relative to the second one of the lenses, such that the at least partial deformation is within the plane of the lenses.

13. The method of claim 12, further comprising:

detecting a configuration of a surface of the substrate and generating a signal based thereon that is used to change a location of the first one of the lenses with respect to the second one of the lenses.

14. The method of claim 12, further comprising:

detecting changes in the location of a surface of the substrate that is used to adjust an overall shape of the array of lenses.