Shower Plate, Method for Manufacturing the Shower Plate, Plasma Processing Apparatus using the Shower Plate, Plasma Processing Method and Electronic Device Manufacturing Method
First Claim
1. A shower plate, which discharges gas for plasma excitation for generating plasma in a plasma processing apparatus, the shower plate being arranged at the plasma processing apparatus, the shower plate comprising:
- a porous-gas passing body having a pore, which communicates in a gas flow direction,wherein the porous-gas passing body is disposed in a longitudinal hole used as a discharging path of the gas for plasma excitation and a pore diameter of a narrow path in a gas flowing path formed by the pore which passes through the porous-gas passing body is not greater than 10 μ
m.
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Accused Products
Abstract
Occurrence of a back-flow of plasma or ignition of gas for plasma excitation in a longitudinal hole portion can be prevented more completely, and a shower plate in which efficient plasma excitation is possible is provided. In shower plate 105, which is arranged in processing chamber 102 of a plasma processing apparatus and discharges gas for plasma excitation into processing chamber, porous-gas passing body 114 having a pore that communicates in the gas flow direction is fixed onto longitudinal hole 112 used as a discharging path of gas for plasma excitation. The pore diameter of a narrow path in a gas flowing path formed of a pore, which communicates to porous-gas passing body 114, is 10 μm or lower.
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Citations
26 Claims
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1. A shower plate, which discharges gas for plasma excitation for generating plasma in a plasma processing apparatus, the shower plate being arranged at the plasma processing apparatus, the shower plate comprising:
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a porous-gas passing body having a pore, which communicates in a gas flow direction, wherein the porous-gas passing body is disposed in a longitudinal hole used as a discharging path of the gas for plasma excitation and a pore diameter of a narrow path in a gas flowing path formed by the pore which passes through the porous-gas passing body is not greater than 10 μ
m. - View Dependent Claims (2, 3, 4, 5, 6, 8, 15, 16, 17, 18, 19, 20, 21, 22, 24, 25, 26)
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7. A shower plate, which includes a plurality of gas discharge holes, which discharges gas for plasma excitation, the shower plate being arranged at a plasma processing apparatus and arranged to generate plasma in the plasma processing apparatus,
wherein a length of a gas discharge hole of the plurality of gas discharge holes is longer than a mean free path of an electron in the plasma processing apparatus.
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9. A shower plate, which is used for plasma processing apparatus, the shower plate comprising:
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a plurality of longitudinal holes provided through the shower plate, wherein a gas discharge side of each longitudinal hole is blocked by a member provided with a plurality of gas discharge holes and a length of each gas discharge hole is longer than a mean free path of an electron in the plasma processing apparatus. - View Dependent Claims (10, 11, 12, 13, 14)
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23. A manufacturing method of a shower plate comprising the steps of:
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inserting a green body, a degreasing body, a temporary sintered body or a sintered body of a ceramic member, which has a plurality of gas discharge holes or gas flow holes, into a longitudinal hole of a green body, the degreasing body or a temporary sintered body of a shower plate, which has been formed by powder ingredients; and
then,sintering them simultaneously.
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Specification