Ejection Surface Cleaning Apparatus, Liquid Ejection Apparatus and Ejection Surface Cleaning Method

• US 20100231634A1
• Filed: 03/11/2010
• Published: 09/16/2010
• Est. Priority Date: 03/13/2009
• Status: Active Grant

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Inventors: Yokota, Yasuyo, Maida, Noriaki
• Granted Patent: US 8,511,793 B2
• Time in Patent Office: Days
• US Class Current: 347/17
• CPC Class Codes: B41J 2/16538 with brushes or wiper blades perpendicular to the nozzle plate
• CPC Class Codes: B41J 2/16552 using cleaning fluids
• CPC Class Codes: B41J 2/17509 Whilst mounted in the printer
• CPC Class Codes: B41J 2002/16567 using ultrasonic or vibrating means
• CPC Class Codes: B41J 29/38 Drives, motors, controls or automatic cut-off devices for the entire printing mechanism

Abstract

An ejection surface cleaning apparatus for cleaning a liquid ejection surface of a liquid ejection head ejecting an ejection liquid, includes: a cleaning liquid deposition device which deposits a cleaning liquid that dissolves or redisperses the ejection liquid, onto the liquid ejection surface; a wiping device which wipes the liquid ejection surface onto which the cleaning liquid has been deposited; and a control device which controls a leave time from deposition of the cleaning liquid onto the liquid ejection surface until wiping performed by the wiping device.

Claims

1. An ejection surface cleaning apparatus for cleaning a liquid ejection surface of a liquid ejection head ejecting an ejection liquid, comprising:

a cleaning liquid deposition device which deposits a cleaning liquid that dissolves or redisperses the ejection liquid, onto the liquid ejection surface;

a wiping device which wipes the liquid ejection surface onto which the cleaning liquid has been deposited; and

a control device which controls a leave time from deposition of the cleaning liquid onto the liquid ejection surface until wiping performed by the wiping device.

2. The ejection surface cleaning apparatus as defined in claim 1, further comprising a temperature and humidity determination device which determines temperature and humidity in a vicinity of the liquid ejection surface,

wherein the control device sets the leave time according to the temperature and the humidity determined by the temperature and humidity determination device.

3. The ejection surface cleaning apparatus as defined in claim 1, wherein the control device sets the leave time according to a required leave time which is a minimum time required to dissolve or redisperse the ejection liquid adhering to the liquid ejection surface with the cleaning liquid and to remove the ejection liquid from the liquid ejection surface by wiping performed by the wiping device, and sets a cleaning liquid drying time which is a maximum possible time for which the cleaning liquid deposited on the liquid ejection surface can be left without drying.

4. The ejection surface cleaning apparatus as defined in claim 3, wherein the control device sets the leave time at least so as not to exceed the cleaning liquid drying time.

5. The ejection surface cleaning apparatus as defined in claim 3, wherein when the required leave time is shorter than the cleaning liquid drying time, the control device sets the leave time so as to be equal to the required leave time.

6. The ejection surface cleaning apparatus as defined in claim 3, wherein when the required leave time is longer than the cleaning liquid drying time, the control device divides an ejection surface cleaning process performed by the cleaning liquid deposition device and the wiping device into a plurality of ejection surface cleaning operations, and sets the leave time of the cleaning liquid per operation so as to be equal to or less than the cleaning liquid drying time.

7. The ejection surface cleaning apparatus as defined in claim 6, wherein the control device performs setting such that a product of the leave time and number of implementations of the plurality of ejection surface cleaning operations is equal to the required leave time.

8. The ejection surface cleaning apparatus as defined in claim 7, wherein the control device sets the leave time so as to be equal to the cleaning liquid drying time.

9. The ejection surface cleaning apparatus as defined in claim 1, further comprising a job time notification device which reports, to the control device, an implementation time of a latest job carried out by the liquid ejection head,

wherein the control device sets the leave time according to the implementation time of the latest job reported from the job time notification device.

10. The ejection surface cleaning apparatus as defined in claim 1, further comprising:

a temperature and humidity determination device which determines temperature and humidity in a vicinity of the liquid ejection surface; and

a job time notification device which reports, to the control device, an implementation time of a latest job carried out by the liquid ejection head,

wherein the control device sets the leave time according to the temperature and the humidity determined by the temperature and humidity determination device, a required leave time which is a minimum time required to dissolve or redisperse the ejection liquid adhering to the liquid ejection surface with the cleaning liquid and to remove the ejection liquid from the liquid ejection surface by wiping performed by the wiping device, a cleaning liquid drying time which is a maximum possible time for which the cleaning liquid deposited on the liquid ejection surface can be left without drying, and the implementation time of the latest job reported from the job time notification device.

11. The ejection surface cleaning apparatus as defined in claim 10, wherein the required leave time is determined according to the temperature and the humidity determined by the temperature and humidity determination device and the implementation time of the latest job reported from the job time notification device.

12. The ejection surface cleaning apparatus as defined in claim 10, wherein the cleaning liquid drying time is derived from the temperature and the humidity determined by the temperature and humidity determination device.

13. The ejection surface cleaning apparatus as defined in claim 10, further comprising a memory storing a cleaning process data table associating the leave time and number of implementations of ejection surface cleaning operations into which an ejection surface cleaning process performed by the cleaning liquid deposition device and the wiping device is divided, with the temperature and the humidity in the vicinity of the liquid ejection surface and the implementation time of the latest job carried out by the liquid ejection head, the leave time and the number of implementations of the ejection surface cleaning operations being determined based on the required leave time and the cleaning liquid drying time calculated from the temperature and the humidity in the vicinity of the liquid ejection surface and the implementation time of the latest job carried out by the liquid ejection head,

wherein the control device acquires the leave time and the number of implementations of the ejection surface cleaning operations, from the temperature and the humidity determined by the temperature and humidity determination device and the implementation time of the latest job reported from the job time notification device with reference to the cleaning process data table.

14. The ejection surface cleaning apparatus as defined in claim 10, further comprising a memory storing a cleaning process data table associating the required leave time and the cleaning liquid drying time with the temperature and the humidity in the vicinity of the liquid ejection surface and the implementation time of the latest job carried out by the liquid ejection head,

wherein the control device acquires the required leave time and the cleaning liquid drying time from the temperature and the humidity determined by the temperature and humidity determination device and the implementation time of the latest job reported from the job time notification device with reference to the cleaning process data table, and calculates the leave time and number of implementations of ejection surface cleaning operations into which an ejection surface cleaning process performed by the cleaning liquid deposition device and the wiping device is divided, from the acquired required leave time and the acquired cleaning liquid drying time.

15. The ejection surface cleaning apparatus as defined in claim 10, further comprising a memory storing a cleaning process data table associating the leave time and number of implementations of ejection surface cleaning operations into which an ejection surface cleaning process performed by the cleaning liquid deposition device and the wiping device is divided, with the temperature and the humidity in the vicinity of the liquid ejection surface and the implementation time of the latest job carried out by the liquid ejection head, the leave time and the number of implementations of the ejection surface cleaning operations being determined based on the required leave time and the cleaning liquid drying time calculated from the temperature and the humidity in the vicinity of the liquid ejection surface and one implementation time of the latest job carried out by the liquid ejection head,

wherein the control device acquires the leave time and the number of implementations of the ejection surface cleaning operations from the temperature and the humidity determined by the temperature and humidity determination device with reference to the cleaning process data table.

16. A liquid ejection apparatus, comprising:

a liquid ejection head which ejects an ejection liquid; and

the ejection surface cleaning apparatus defined in claim 1.

17. An ejection surface cleaning method of cleaning a liquid ejection surface of a liquid ejection head ejecting an ejection liquid, the ejection surface cleaning method comprising the steps of:

depositing a cleaning liquid that dissolves or redisperses the ejection liquid, onto the liquid ejection surface; and

wiping the liquid ejection surface onto which the cleaning liquid has been deposited, with a wiping device,

wherein a leave time from deposition of the cleaning liquid onto the liquid ejection surface until wiping performed by the wiping device is controlled.