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MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

  • US 20100231883A1
  • Filed: 03/19/2010
  • Published: 09/16/2010
  • Est. Priority Date: 10/09/2007
  • Status: Active Grant
First Claim
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1. An apparatus, comprising:

  • a primary illumination system configured to produce an intensity distribution of projection light in a mask plane;

    a projection objective comprising a lens; and

    a correction optical system, comprising;

    a secondary illumination system configured to produce an intensity distribution of correction light in a reference surface; and

    a correction element comprising a heating material, the correction element being in a plane that is at least substantially optically conjugate to the reference surface so that the correction light and the projection light pass through the lens of the projection objective before they impinge on the correction element,wherein all lenses through which both the correction light and the projection light pass comprise one or more lens materials having a lower coefficient of absorption for the correction light than the heating material, and the apparatus is a microlithographic projection exposure apparatus.

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