METHOD OF PRODUCING GAS BARRIER LAYER, GAS BARRIER FILM FOR SOLAR BATTERIES AND GAS BARRIER FILM FOR DISPLAYS
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Abstract
A method according to the invention comprises: starting plasma discharge for forming the gas barrier layer in a film deposition chamber; and producing the gas barrier layer by using a plasma after a first predetermined period of time has elapsed from a start of the plasma discharge.
19 Citations
36 Claims
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1-18. -18. (canceled)
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19. A method of producing a gas barrier layer made of silicon nitride, silicon carbide or silicon carbonitride by plasma-enhanced CVD, comprising:
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starting plasma discharge for forming the gas barrier layer in a film deposition chamber; and producing the gas barrier layer by using a plasma after a first predetermined period of time has elapsed from a start of the plasma discharge. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
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Specification