POST-RELEASE ADJUSTMENT OF INTERFEROMETRIC MODULATOR REFLECTIVITY
First Claim
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1. An optical display system comprising an array of interferometric modulators, each interferometric modulator comprising:
- a substrate;
an optical stack formed on the substrate;
a movable reflective layer, wherein the movable reflective layer has a plurality of etch holes;
support posts extending between the substrate and the movable reflective layer;
a cavity defined by the space between the movable reflective layer and the optical stack; and
a reflectivity modifying layer disposed on at least one surface defining the cavity of at least one but fewer than all interferometric modulators in the array, wherein the cavity and optical stack of the at least one interferometric modulator without the reflectivity modifying layer have a first reflectance spectrum with a first reflectivity peak and the cavity and optical stack of the at least one interferometric modulator with the reflectivity modifying layer have a second reflectance spectrum with a second reflectivity peak.
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Abstract
In various embodiments, devices, methods, and systems for adjusting the reflectivity spectrum of a microelectromechanical systems (MEMS) device are described herein. The method comprises depositing a reflectivity modifying layer with the optical cavity of an interferometric modulator, where the reflectivity modifying layer shifts or trims the shape of the interferometric modulator'"'"'s wavelength reflectivity spectrum relative to the absence of the reflectivity modifying layer.
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Citations
53 Claims
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1. An optical display system comprising an array of interferometric modulators, each interferometric modulator comprising:
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a substrate; an optical stack formed on the substrate; a movable reflective layer, wherein the movable reflective layer has a plurality of etch holes; support posts extending between the substrate and the movable reflective layer; a cavity defined by the space between the movable reflective layer and the optical stack; and a reflectivity modifying layer disposed on at least one surface defining the cavity of at least one but fewer than all interferometric modulators in the array, wherein the cavity and optical stack of the at least one interferometric modulator without the reflectivity modifying layer have a first reflectance spectrum with a first reflectivity peak and the cavity and optical stack of the at least one interferometric modulator with the reflectivity modifying layer have a second reflectance spectrum with a second reflectivity peak. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A method for adjusting the reflectivity characteristics of an interferometric modulator comprising:
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depositing a deposition modifying layer over at least one exposed region of the interferometric modulator while forming the interferometric modulator, wherein the interferometric modulator comprises; an optical stack; a movable reflective layer; and support structures; depositing a sacrificial layer; removing the sacrificial layer to form a cavity; and depositing a reflectivity modifying layer after removing the sacrificial layer, wherein either the reflectivity modifying layer preferentially deposits on the deposition modifying layer relative to other surfaces of the interferometric modulator or deposition of the reflectivity modifying layer is inhibited on the deposition modifying layer relative to the other surfaces. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
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33. A method for improving the color saturation of an interferometric modulator having a reflectivity curve, the method comprising:
depositing in an optical cavity of a released interferometric modulator a material that absorbs a significant portion of the reflectance spectrum of the released interferometric modulator, thereby reducing by at least about 1% to about 5% an area under the reflectivity curve of the interferometric modulator relative to absence of the material.
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34. A method of adjusting reflectivity of an optical electromechanical system device, comprising:
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providing an array of fabricated optical electromechanical system devices, each of the devices including a preformed cavity; determining a desired reflectivity change of at least one of the devices; and selectively changing the reflectivity of the at least one device without changing the reflectivity of other devices in the array. - View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46)
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47. An interferometric modulator comprising:
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a partially reflective layer; a movable reflective layer; an optical cavity defined by the partially reflective layer and the movable reflective layer, wherein the movable reflective layer is movable between an actuated position and a relaxed position; and a reflectivity modifying layer disposed on more than one surface of the optical cavity, wherein the reflectivity modifying layer is between about 1 nm and about 10 nm thick and has a refractive index of between about 1.3 and about 6. - View Dependent Claims (48, 49, 50)
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51. A method for improving the color saturation of an interferometric modulator, the method comprising:
depositing in an optical cavity of a released interferometric modulator a material that absorbs a significant portion of the reflectance spectrum of the released interferometric modulator. - View Dependent Claims (52, 53)
Specification