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FERROELECTRIC THIN FILMS

  • US 20100252901A1
  • Filed: 06/16/2010
  • Published: 10/07/2010
  • Est. Priority Date: 07/07/2006
  • Status: Active Grant
First Claim
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1. A ferroelectric structure, comprising:

  • a first electrode comprising a first layer having a periodic atomic arrangement;

    a ferroelectric thin film comprising a first termination and a second termination;

    wherein at least a portion of the first layer of the first electrode is in epitaxial contact with at least a portion of the first termination of the ferroelectric thin film; and

    wherein the first termination of the ferroelectric thin film has a periodic atomic arrangement that approximately matches the periodic atomic arrangement of the first layer of the first electrode.

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