MIRROR ARRAYS FOR MASKLESS PHOTOLITHOGRAPHY AND IMAGE DISPLAY
First Claim
1. A micromirror having an exposed surface area, the micromirror comprising:
- a polymeric mirror base;
a reflective dielectric multilayer disposed over the polymeric mirror base; and
a device layer positioned below the polymeric mirror base for adjusting a position of the micromirror;
wherein the reflective dielectric multilayer covers more than 50% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 90% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm.
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Abstract
Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.
115 Citations
61 Claims
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1. A micromirror having an exposed surface area, the micromirror comprising:
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a polymeric mirror base; a reflective dielectric multilayer disposed over the polymeric mirror base; and a device layer positioned below the polymeric mirror base for adjusting a position of the micromirror; wherein the reflective dielectric multilayer covers more than 50% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 90% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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- 26. A large area micromirror array comprising a plurality of micromirrors, wherein each micromirror element has an exposed surface area and comprises a polymeric base and a reflective dielectric multilayer disposed over the polymeric base, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 90% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm.
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35. A digital micromirror display device comprising:
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a source of electromagnetic radiation; and a micromirror array comprising a plurality of micromirror elements, wherein each micromirror element has a surface area exposed to electromagnetic radiation from the source and comprises a polymeric base and a reflective dielectric multilayer disposed over the polymeric base, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 90% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm. - View Dependent Claims (36, 37, 38, 39, 40, 41, 42)
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43. A method of making a micromirror, the method comprising the steps of:
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providing a first substrate having a first surface; providing one or more metal electrodes on the first surface of the first substrate; providing a first polymer layer over one or more regions of the first surface of the first substrate; providing a second substrate; providing a sacrificial layer over the second substrate; providing a reflective dielectric multilayer on the sacrificial layer; providing a metal layer over the reflective dielectric multilayer; providing a second polymer layer over the metal layer; contacting the second polymer layer of the second substrate with the first polymer layer of the first substrate; and removing the sacrificial layer, thereby separating the second substrate from the reflective dielectric multilayer. - View Dependent Claims (44, 45, 46, 47, 48)
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49. A maskless photolithography method, the method comprising the steps of:
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providing a substrate; providing a source of electromagnetic radiation; providing an array of micromirror elements, wherein each micromirror element has a surface area exposed to the electromagnetic radiation and comprises a polymeric base and a reflective dielectric multilayer disposed over the polymeric base, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 90% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm; controlling a position of each micromirror element of the array such that electromagnetic radiation from the source is reflected from each micromirror element to a location either on or off of the substrate; and directing electromagnetic radiation from the source onto the micromirror array, thereby generating a reflected pattern of electromagnetic radiation on the substrate. - View Dependent Claims (50, 51, 52, 53, 54)
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55. A method of displaying an image, the method comprising the steps of:
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providing a surface for displaying the image; providing a source of electromagnetic radiation; providing an array of micromirror elements, wherein each micromirror element has a surface area exposed to the electromagnetic radiation and comprises a polymeric base and a reflective dielectric multilayer disposed over the polymeric base, wherein the reflective dielectric multilayer covers 50% to 100% of the exposed surface area and the reflective dielectric multilayer has a reflectivity selected over the range of 90% to 100% for at least a portion of electromagnetic radiation having wavelengths in the range of 150 to 1100 nm; controlling a position of each micromirror element of the array such that electromagnetic radiation from the source is reflected from each micromirror element to a location either on or off of the surface; and directing electromagnetic radiation from the source onto the micromirror array, thereby displaying an image on the surface. - View Dependent Claims (56, 57, 58, 59, 60, 61)
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Specification