METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA
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Abstract
Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space (1, 2). The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent, the plasma generator being arranged remote from the treatment space (1, 2).
425 Citations
74 Claims
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1-37. -37. (canceled)
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38. Method for atomic layer deposition on a surface of a substrate (6), comprising
conditioning the surface for atomic layer deposition by providing reactive surface sites; - providing a precursor material to the surface for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate; and
subsequently providing a gas mixture generated in an atmospheric pressure glow discharge plasma remote from the substrate and applying said gas mixture subsequently to the surface covered with precursor molecules, said gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites. - View Dependent Claims (39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57)
- providing a precursor material to the surface for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate; and
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58. Apparatus for atomic layer deposition on a surface of a substrate (6) in a treatment space (1, 2;
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5;
47), the apparatus comprisinga gas supply device (15, 16) for providing various gas mixtures to the treatment space (1, 2;
5;
47), the gas supply device (15, 16) being arranged to provide a gas mixture comprising a precursor material to the treatment space (1, 2;
5;
47) for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate (6), and subsequently to provide a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites,the apparatus further comprising a plasma generator (10) for generating an atmospheric pressure glow discharge plasma in the gas mixture comprising the reactive agent, the plasma generator (10) being arranged remote from the treatment space (1, 2;
5;
47). - View Dependent Claims (60, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74)
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5;
Specification