Method of forming an indium-containing transparent conductive oxide film, metal targets used in the method and photovoltaic devices utilizing said films
First Claim
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1. A method of forming an indium-containing transparent conductive oxide film comprising:
- a) reactive sputtering a metal target comprising indium in an oxygen-containing atmosphere to form an indium-containing oxideb) depositing the indium oxide on a substrate to form said transparent conductive oxide film.
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Abstract
A method of forming an indium-containing transparent conductive oxide by reactive sputtering a metal target containing indium in an oxygen containing atmosphere and then depositing the resulting indium oxide on a substrate. Metal targets used in the method and photovoltaic devices utilizing the transparent conductive oxides are also disclosed.
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26 Claims
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1. A method of forming an indium-containing transparent conductive oxide film comprising:
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a) reactive sputtering a metal target comprising indium in an oxygen-containing atmosphere to form an indium-containing oxide b) depositing the indium oxide on a substrate to form said transparent conductive oxide film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification