Method for Forming Shielded Gate Trench FET with Multiple Channels
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Abstract
A method of forming a field effect transistor (FET) includes the following steps. A pair of trenches extending into a semiconductor region of a first conductivity type is formed. A shield electrode is formed in a lower portion of each trench. A gate electrode is formed in an upper portion of each trench over but insulated from the shield electrode. First and second well regions of a second conductivity type are formed in the semiconductor region between the pair of trenches such that the first and second well regions are vertically spaced from one another and laterally abut sidewalls of the pair of trenches. The gate electrode and the first shield electrode are formed relative to the first and second well regions such that a channel is formed in each of the first and second well regions when the FET is biased in the on state.
105 Citations
28 Claims
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1-22. -22. (canceled)
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23. A method of forming a field effect transistor (FET), the method comprising:
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forming a pair of trenches extending into a semiconductor region of a first conductivity type; forming a shield electrode in a lower portion of each trench; forming a gate electrode in an upper portion of each trench over but insulated from the shield electrode; and forming first and second well regions of a second conductivity type in the semiconductor region between the pair of trenches such that the first and second well regions are vertically spaced from one another and laterally abut sidewalls of the pair of trenches, wherein the gate electrode and the first shield electrode are formed relative to the first and second well regions such that a channel is formed in each of the first and second well regions when the FET is biased in the on state. - View Dependent Claims (24, 25, 26, 27, 28)
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Specification