Magnetic Film Enhanced Inductor
First Claim
Patent Images
1. A transformer comprising:
- a transformer metal having a first portion and a second portion; and
an isolation film interposing the first portion and the second portion of the transformer metal,wherein the isolation film includes a magnetic material.
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Abstract
An integrated magnetic film enhanced transformer and a method of forming an integrated magnetic film enhanced transformer are disclosed. The integrated magnetic film enhanced transformer includes an transformer metal having a first portion and a second portion, a top metal coupled to the transformer metal, a bottom metal coupled to the transformer metal, and an isolation film disposed between the first portion and the second portion of the transformer metal. The isolation film includes a magnetic material that can enhance a magnetic flux density B of the transformer, increase an electromotive force (EMF) of the transformer, and increase a magnetic permeability of the transformer.
15 Citations
67 Claims
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1. A transformer comprising:
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a transformer metal having a first portion and a second portion; and an isolation film interposing the first portion and the second portion of the transformer metal, wherein the isolation film includes a magnetic material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A transformer comprising:
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a substrate; a transformer metal having a plurality of turns formed on the substrate; and a magnetic material disposed between adjacent portions of the plurality of turns of the transformer metal. - View Dependent Claims (14, 15, 16, 17)
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18. An integrated magnetic film enhanced three-dimensional circular self coupling transformer comprising:
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a transformer metal having a plurality of top metal portions, a plurality of via interconnects, and a plurality of bottom metal portions extending along a longitudinal axis of the transformer; and a magnetic material disposed between adjacent portions of the transformer metal. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25)
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26. A method of forming a transformer, the method comprising:
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depositing and patterning a transformer metal having a first portion and a second portion; and depositing and patterning a magnetic material between the first portion and the second portion of the transformer metal. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33)
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34. A method of forming a transformer, the method comprising:
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depositing and patterning a bottom metal using a metal deposit/photo/etching process; depositing a first inter layer dielectric (ILD) on the first metal and performing a chemical mechanical planarization (CMP) process on the inter layer dielectric; depositing a bottom cap film on the first inter layer dielectric (ILD); depositing an transformer metal on the bottom cap film and patterning the transformer metal using a photo/etching process; depositing a top cap film above the transformer metal and performing a chemical mechanical planarization (CMP) process on the top cap film; performing a photo/etching process to the top cap film to form a plurality of holes between portions of the transformer metal; depositing a magnetic material over the top cap film and the plurality of holes and etching the magnetic material back to a top of the top cap film such that the magnetic material is interposed between the portions of the transformer metal; depositing a second inter layer dielectric (ILD) above the magnetic material and performing a chemical mechanical planarization (CMP) process on the second inter layer dielectric (ILD); and performing a vertical magnetic anneal to align a magnetic field axis of the transformer along an easy axis of the magnetic material. - View Dependent Claims (35, 36, 37, 38, 39, 40)
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41. A method of forming a transformer, the method comprising:
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depositing and patterning a bottom metal using a dual damascene process; depositing a first inter layer dielectric (ILD) on the first metal; depositing a bottom cap film on the first inter layer dielectric (ILD); depositing a second inter layer dielectric (ILD) on the bottom cap film; forming a plurality of trenches in the second inter layer dielectric (ILD) using photolithography and etching techniques; plating a copper layer over at least the plurality of trenches and polishing the copper layer down to the surface of the second inter layer dielectric (ILD) to form an transformer metal; depositing a top cap film above the second inter layer dielectric (ILD) and the transformer metal; forming a plurality of holes in the top cap film and the second inter layer dielectric (ILD) using photolithography and etching techniques; depositing a magnetic material layer over at least the plurality of holes; depositing a third inter layer dielectric (ILD) above the magnetic material and performing a chemical mechanical planarization (CMP) process on the third inter layer dielectric (ILD); and performing a vertical magnetic anneal to align a magnetic field axis of the transformer along an easy axis of the magnetic material. - View Dependent Claims (42, 43, 44, 45, 46, 47)
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48. A transformer comprising:
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transformer means for generating a magnetic field, the transformer means having a first portion and a second portion; and isolating means for magnetically isolating the first portion and the second portion of the transformer means, the isolating means interposing the first portion and the second portion of the transformer means, wherein the isolating means includes a magnetic material. - View Dependent Claims (49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59)
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60. A method of forming a transformer, the method comprising:
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step for depositing and patterning a transformer metal having a first portion and a second portion; and step for depositing and patterning a magnetic material between the first portion and the second portion of the transformer metal. - View Dependent Claims (61, 62, 63, 64, 65, 66, 67)
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Specification