Optical System for Increasing Illumination Efficiency of a Patterning Device

• US 20100259743A1
• Filed: 06/30/2010
• Published: 10/14/2010
• Est. Priority Date: 04/13/2006
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Smirnov, Stanislav Y.
• Granted Patent: US 8,634,064 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70083 Non-homogeneous intensity distribution in the mask plane
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

A lithography system can include a radiation source, an illumination system, a patterning device, and a projection system. The illumination system can be configured to process a beam of radiation to produce a plurality of beams of radiation. The illumination system can include a pupil defining element, a condenser lens, a field defining element, a first relay that includes first and second lens arrays, a plurality of rods, a diaphragm having transmission areas, and a second relay. The patterning device can be configured to pattern the plurality of beams of radiation. Further, the projection system can be configured to project the patterned beams onto a substrate.

Claims

1. A lithography system, comprising:

a radiation source configured to produce a beam of radiation;

an illumination system configured to process the beam to produce a plurality of beams of radiation, the illumination system comprising;

a pupil defining element,

a condenser lens,

a field defining element,

a first relay comprising first and second lens arrays,

a plurality of rods,

a diaphragm having transmission areas, and

a second relay;

a patterning device configured to pattern the plurality of beams of radiation; and

a projection system configured to project the patterned beams onto a substrate.

2. The lithography system of claim 1, further comprising:

a second relay that directs light from the transmission areas onto corresponding ones of the active areas of the patterning device, wherein the second relay directs light substantially within respective boundaries of the corresponding ones of the active areas.

3. The lithography system of claim 1, further comprising:

a second relay located between the plurality of rods and the patterning device.

4. The lithography system of claim 1, wherein the plurality of rods correspond in number and arrangement to a number and arrangement of lenses in the second lens array.

5. The lithography system of claim 1, wherein the transmission areas correspond in number, arrangement, and shape to a number, arrangement, and cross-sectional shape of rods in the plurality of rods.

6. The lithography system of claim 1, wherein the patterning device comprises an array of individually controllable elements each having an active area corresponding in number, arrangement, and shape to a number, arrangement, and shape of the transmission areas.

7. The lithography system of claim 1, wherein the plurality of rods comprises glass rods or hollow rods.

8. The lithography system of claim 1, wherein the first and second lens arrays comprise first and second fly'"'"'s eye lens arrays or first and second microlens arrays.