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METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATE

  • US 20100266765A1
  • Filed: 04/21/2009
  • Published: 10/21/2010
  • Est. Priority Date: 04/21/2009
  • Status: Abandoned Application
First Claim
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1. An apparatus for growing a thin film onto a substrate according to the ALD method, the apparatus comprising:

  • a reaction chamber;

    a reactant source in fluid communication with the reaction chamber via a first conduit;

    an inactive gas source in fluid communication with the reaction chamber via a second conduit, wherein the second conduit is in fluid communication with the first conduit at a first connection point located upstream of the reaction chamber;

    a backsuction conduit in fluid communication with the first conduit, wherein the backsuction conduit is in fluid communication with the first conduit at a second connection point, and the second connection point is located upstream of the first connection point;

    a first non-fully closing valve located along the backsuction conduit downstream of the second connection point, wherein the first non-fully closing valve is switchable between a fully opened position and a fully closed position, and the first non-fully closing valve allows flow therethrough when in either position; and

    a controller for switching the first non-fully closing valve between the fully opened position and the fully closed position, wherein the controller is configured to switch the first non-fully closing valve to the fully closed position to deliver reactant from the reactant source to the reaction chamber while the first non-fully closing valve remains in the closed position.

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