APPARATUS OF INSPECTING DEFECT IN SEMICONDUCTOR AND METHOD OF THE SAME
First Claim
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1. A defect inspection apparatus comprising:
- an illumination unit for illuminating light to an object to be inspected,a detection unit for detecting scattered light from the object to be inspected,a signal processing unit for detecting a defect by processing a detection signal of the scattered light detected by the detection unit, calculating size of the defect detected by the defect detection unit, and calibrating the size of the defect calculated by the calculating, by using a relationship between a size of a defect whose size is known and a size of the defect calculated.
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Abstract
When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.
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Citations
12 Claims
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1. A defect inspection apparatus comprising:
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an illumination unit for illuminating light to an object to be inspected, a detection unit for detecting scattered light from the object to be inspected, a signal processing unit for detecting a defect by processing a detection signal of the scattered light detected by the detection unit, calculating size of the defect detected by the defect detection unit, and calibrating the size of the defect calculated by the calculating, by using a relationship between a size of a defect whose size is known and a size of the defect calculated. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A defect inspection method comprising steps of:
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illuminating light to an object to be inspected, detecting light scattered from the object to be inspected due to irradiation of the light, detecting a defect by processing a detection signal of the scattered light, calculating size of the detected defect, and calibrating the size of the defect calculated, by using a relationship between a size of a defect whose size is known and a size of the defect calculated. - View Dependent Claims (8, 9, 10, 11, 12)
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Specification