APPARATUS AND METHOD FOR THE PRODUCTION OF CARBON NANOTUBES ON A CONTINUOUSLY MOVING SUBSTRATE

• US 20100272891A1
• Filed: 07/08/2010
• Published: 10/28/2010
• Est. Priority Date: 04/10/2009
• Status: Abandoned Application

• Current Assignee: Applied NanoStructured Solutions, LLC (Cabot Corporation)
• Original Assignee: Lockheed Martin Corporation (Martin Marietta Corporation)
• Inventors: Larue, John A., Braine, Jack K., Loebach, James P., MALECKI, Harry C., Shah, Tushar K., Alberding, Mark R.
• Application Number:
  US12/832,919
• Publication Number:
  US 20100272891A1
• Time in Patent Office: Days
• US Class Current: 427/249.100
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C01B 32/15 Nano-sized carbon materials
• CPC Class Codes: C23C 16/45519 Inert gas curtains
• CPC Class Codes: C23C 16/545 for coating elongated substrates

Abstract

An apparatus having at least one carbon nanotube growth zone having a substrate inlet sized to allow a spoolable length substrate to pass therethrough. The apparatus also has at least one heater in thermal communication with the carbon nanotube growth zone. The apparatus has at least one feed gas inlet in fluid communication with the carbon nanotube growth zone. The apparatus is open to an atmospheric environment during operation.

Claims

1. An apparatus comprising:

at least one carbon nanotube growth zone having a substrate inlet sized to allow a spoolable length substrate to pass therethrough;

at least one heater in thermal communication with the carbon nanotube growth zone; and

at least one feed gas inlet in fluid communication with the carbon nanotube growth zone;

wherein the apparatus is open to an atmospheric environment during operation.

2. The apparatus of claim 1, comprising a purge zone.

3. The apparatus of claim 1, comprising at least two purge zones on opposing sides of the carbon nanotube growth zone.

4. The apparatus of claim 1, comprising a substrate outlet.

5. The apparatus of claim 1, wherein the feed gas inlet is in the carbon nanotube growth zone.

6. The apparatus of claim 2, comprising a purge gas inlet in the purge zone.

7. The apparatus of claim 1, wherein a cross sectional area of the carbon nanotube growth zone is no greater than about 10000 times a cross sectional area of the spoolable length substrate.

8. The apparatus of claim 1, wherein the carbon nanotube growth zone has an internal volume no greater than about 10000 times a volume of a section of the spoolable length substrate;

wherein the section of the spoolable length substrate has a length substantially equal to the length of the carbon nanotube growth zone.

9. The apparatus of claim 1, wherein the carbon nanotube growth zone is formed by a metal enclosure.

10. The apparatus of claim 9, wherein the metal is stainless steel.

11. The apparatus of claim 1, comprising at least two carbon nanotube growth zones.

12. A method comprising:

providing an apparatus having at least one carbon nanotube growth zone having a substrate inlet sized to allow a spoolable length substrate to pass therethrough, wherein the apparatus is open to an atmospheric environment;

providing a substrate;

introducing a portion of the substrate into carbon nanotube growth zone via the inlet;

introducing a feed gas into the carbon nanotube growth zone; and

passing the portion of the substrate through the carbon nanotube growth zone, such that carbon nanotubes form on the portion of the substrate.

13. The method of claim 12, comprising removing the portion of the substrate and carbon nanotubes formed thereon from the carbon nanotube growth zone.

14. The method of claim 12, wherein the steps are performed in the order recited in claim 12.

15. The method of claim 12, wherein the apparatus has at least one purge zone, the method further comprising purging the purge zone prior to introducing the portion of the substrate into the carbon nanotube growth zone.

16. The method of claim 12, further comprising preheating the feed gas prior to introducing the feed gas into the carbon nanotube growth zone.

17. The method of claim 15, wherein the apparatus has comprises an additional purge zone on an opposing side of the carbon nanotube growth zone from the first purge zone, the method further comprising purging the additional purge zone after the portion of the substrate has passed through the carbon nanotube growth zone.

18. The method of claim 12, wherein the apparatus has at least two carbon nanotube growth zones, the method comprising passing the portion of the substrate through each of the carbon nanotube growth zones.