Dual tone development with a photo-activated acid enhancement component in lithographic applications
First Claim
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1. A method of patterning a substrate, comprising:
- forming a layer of radiation-sensitive material on a substrate, said layer of radiation-sensitive material comprises two or more photo-activated acid enhancement components; and
exposing said layer of radiation-sensitive material to electromagnetic (EM) radiation, said EM radiation containing a first wavelength or first range of wavelengths, and a second wavelength or second range of wavelengths different from said first wavelength or first range of wavelengths,wherein one of said two or more photo-activated acid enhancement components augments an acid concentration in said layer of radiation-sensitive material when exposed to said EM radiation at said first wavelength or first range of wavelengths, andwherein another of said two or more photo-activated acid enhancement components augments said acid concentration in said layer of radiation-sensitive material when exposed to EM radiation at a second wavelength or second range of wavelengths.
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Abstract
A method and system for patterning a substrate using a lithographic process, such as a dual tone development process, is described. The method comprises use of at least one photo-activated acid enhancement component to improve process latitude for the dual tone development process.
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Citations
20 Claims
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1. A method of patterning a substrate, comprising:
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forming a layer of radiation-sensitive material on a substrate, said layer of radiation-sensitive material comprises two or more photo-activated acid enhancement components; and exposing said layer of radiation-sensitive material to electromagnetic (EM) radiation, said EM radiation containing a first wavelength or first range of wavelengths, and a second wavelength or second range of wavelengths different from said first wavelength or first range of wavelengths, wherein one of said two or more photo-activated acid enhancement components augments an acid concentration in said layer of radiation-sensitive material when exposed to said EM radiation at said first wavelength or first range of wavelengths, and wherein another of said two or more photo-activated acid enhancement components augments said acid concentration in said layer of radiation-sensitive material when exposed to EM radiation at a second wavelength or second range of wavelengths. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of patterning a substrate, comprising:
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forming a layer of radiation-sensitive material on a substrate, said layer of radiation-sensitive material comprises at least one photo-activated acid enhancement component; performing a patterned exposure of said layer of radiation-sensitive material to first electromagnetic (EM) radiation, said first EM radiation containing a first wavelength or first range of wavelengths; and performing a flood exposure of said layer of radiation-sensitive material to second EM radiation, said second EM radiation containing a second wavelength or second range of wavelengths, wherein said at least one photo-activated acid enhancement component augments an acid concentration in said layer of radiation-sensitive material when exposed to said second EM radiation. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification