METHODS AND APPARATUS FOR INSITU ANALYSIS OF GASES IN ELECTRONIC DEVICE FABRICATION SYSTEMS

• US 20100275674A1
• Filed: 07/09/2010
• Published: 11/04/2010
• Est. Priority Date: 07/31/2006
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Carlson, David K., Kuppurao, Satheesh
• Granted Patent: US 8,020,427 B2
• Time in Patent Office: Days
• US Class Current: 73/23.21
• CPC Class Codes: G01N 33/0016 by regulating a physical variable, e.g. pressure, temperature
• CPC Class Codes: Y10T 137/85978 With pump

Abstract

Systems and methods are disclosed that include adjusting a pressure level of a sample gas in a testing chamber, for example, using a pressurized inert reference gas, and determining a composition of the adjusted sample gas. By adjusting the pressure level of the sample gas, the composition of the sample gas may be determined more accurately than otherwise possible. Numerous other aspects are disclosed.

Claims

1. A method for testing a sample gas comprising:

adjusting a pressure level of a sample gas; and

determining a composition of the adjusted sample gas;

wherein the adjusting includes adjusting the pressure level from a low pressure at which measurement by spectroscopy would not be accurate to a higher pressure within a high enough suitable range at which the composition of the sample gas is capable of being accurately determined by spectroscopy; and

wherein adjusting the pressure level includes adding additional sample gas to the sample gas in a closed chamber.

2. The method of claim 1 wherein adjusting the pressure level includes controlling a booster pump and a variable outlet orifice.

3. The method of claim 1 wherein adjusting the pressure level includes controlling an adjustable booster pump supplying additional sample gas.

4. The method of claim 3 wherein controlling the adjustable booster pump further comprises:

receiving feedback from a pressure monitor.

5. The method of claim 4 further comprising:

adjusting operation of the adjustable booster pump based on the feedback.

6. The method of claim 1 wherein adjusting the pressure level includes controlling a variable outlet orifice.

7. The method of claim 6 further comprising:

isolating the sample cell once a desired pressure range is achieved.

8. The method of claim 1 wherein determining a composition of the adjusted sample gas includes measuring a pressure of the sample gas before and after the pressure level of the sample gas is adjusted.

9. The method of claim 8 further comprising:

determining whether the measured pressure has reached a level suitable for accurate determination of the sample gas composition.

10. An apparatus for testing a sample gas comprising:

a chamber adapted to contain a gas to be tested;

a fitting coupled to the chamber and adapted to deliver a sample gas to the chamber; and

a controller adapted to adjust a pressure level of the sample gas in the chamber;

wherein the adjustment includes adjusting the pressure level from a low pressure at which measurement by spectroscopy would not be accurate to a higher pressure within a high enough suitable range at which a composition of the sample gas is capable of being accurately determined by spectroscopy; and

wherein the controller is coupled to a sample gas supply.

11. The apparatus of claim 10 wherein the controller includes a booster pump.

12. The apparatus of claim 10 wherein the controller includes an adjustable booster pump.

13. The apparatus of claim 10 wherein the controller includes a variable outlet orifice.

14. The apparatus of claim 10 wherein the controller is coupled to a pressure monitor.

15. The apparatus of claim 14 wherein the pressure monitor is adapted to provide feedback to the controller regarding the pressure level.

16. A system for testing sample gases comprising:

a processing tool having a plurality of isolatable spaces containing gases to be tested;

a chamber adapted to contain a sample gas to be tested;

a fitting for selectively coupling the chamber to the plurality of spaces; and

a controller adapted to adjust a pressure level of the sample gas in the chamber;

wherein the adjustment includes adjusting the pressure level from a low pressure at which measurement by spectroscopy would not be accurate to a higher pressure within a high enough suitable range at which a composition of the sample gas is capable of being accurately determined by spectroscopy; and

wherein the controller is coupled to a sample gas supply.

17. The system of claim 16 wherein the controller includes a booster pump.

18. The system of claim 16 wherein the controller includes an adjustable booster pump.

19. The system of claim 16 wherein the controller includes a variable outlet orifice.

20. The system of claim 16 wherein the controller is coupled to a pressure monitor;

and

wherein the pressure monitor is adapted to provide feedback to the controller regarding the pressure level.