COMBINED OPTICAL METROLOGY TECHNIQUES
First Claim
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1. A method for measuring properties of a sample, comprising:
- providing an optical metrology tool that includes a first optical metrology apparatus, the first optical metrology apparatus being a first reflectometer having at least in part below deep ultra-violet light wavelengths; and
providing a second optical metrology apparatus within the optical metrology tool, the second optical metrology apparatus providing optical measurements for the sample utilizing a different optical metrology technique as compared to the first optical metrology apparatus,wherein data sets from the first optical metrology apparatus and the second optical metrology apparatus are combined and analyzed in order to measure at least one property of the sample.
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Abstract
A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-θ stage to further reduce the footprint.
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Citations
11 Claims
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1. A method for measuring properties of a sample, comprising:
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providing an optical metrology tool that includes a first optical metrology apparatus, the first optical metrology apparatus being a first reflectometer having at least in part below deep ultra-violet light wavelengths; and providing a second optical metrology apparatus within the optical metrology tool, the second optical metrology apparatus providing optical measurements for the sample utilizing a different optical metrology technique as compared to the first optical metrology apparatus, wherein data sets from the first optical metrology apparatus and the second optical metrology apparatus are combined and analyzed in order to measure at least one property of the sample. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification