Imprint Alignment Method, System and Template

• US 20100278955A1
• Filed: 07/13/2010
• Published: 11/04/2010
• Est. Priority Date: 07/20/2004
• Status: Active Grant

• Current Assignee: Mii Newco, Inc.
• Original Assignee: Molecular Imprints, Inc. (Canon Inc.)
• Inventors: Voisin, Ronald D.
• Granted Patent: US 8,366,434 B2
• Time in Patent Office: Days
• US Class Current: 425/385
• CPC Class Codes: G03F 7/7035 Proximity or contact printers
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: Y10S 977/887 Nanoimprint lithography, i.e. nanostamp

Abstract

Imprint lithography templates for patterning substrates are described. The templates include a section having a mold, a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional sections may include a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern.

Claims

1. A nano imprint lithography template, comprising:

a plurality of sections including;

a first section having a mold and a first subset of alignment forming areas and a plurality of template alignment marks defining a first pattern; and

a second section having a second subset of alignment forming areas and a plurality of template alignment marks defining a second pattern;

wherein the first pattern corresponds to the second pattern.

2. The nano imprint lithography template of claim 1, wherein the second section is devoid of a mold.

3. The nano imprint lithography template of claim 1, wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are grating alignment marks.

4. The template of claim 1, wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are substantially planar.

5. A nano imprint lithography template, comprising:

a first section having first dimensions of a length and a width, the first section having a mold with a relief pattern; and

,

a second section having second dimensions of a length and a width, the second section devoid of a mold, wherein the first dimensions are substantially similar to the second dimensions.

6. The nano imprint lithography template of claim 5, further comprising a first pattern of alignment forming areas and template alignment marks positioned adjacent to the first section.

7. The nano imprint lithography template of claim 6, further comprising a second pattern of alignment forming areas and template alignment marks positioned adjacent to the second section, wherein the first pattern is different from the second pattern.

8. A nano imprint lithography template, comprising:

a plurality of sections, each section having substantially similar dimensions of length and width, with only one of the plurality of sections having a mold, the mold having a relief pattern defined therein.

9. The template of claim 8, further comprising a plurality of alignment forming areas and template alignment marks.

10. The template of claim 9, wherein each section is separated from each adjacent section by a street and each section is separated from the perimeter of the template by a street and the plurality of alignment forming areas and template alignment marks are positioned within the streets.

11. The template of claim 10, wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are grating alignment marks.

12. The template of claim 10, wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are substantially planar.

13. The template of claim 8, further comprising a first subset of alignment forming areas and a first subset of template alignment marks defining a first pattern positioned adjacent to the mold.

14. The template of claim 13, further comprising a second subset of alignment forming areas and a second subset of template alignment marks defining a second pattern, wherein the second pattern corresponds to the first pattern.