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PLASMA PROCESS APPARATUS AND PLASMA PROCESS METHOD

  • US 20100278999A1
  • Filed: 04/28/2010
  • Published: 11/04/2010
  • Est. Priority Date: 05/01/2009
  • Status: Active Grant
First Claim
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1. A plasma process apparatus that applies a plasma process to an object to be processed, the plasma process apparatus comprising:

  • a cylindrical processing container configured to be evacuatable to vacuum;

    a holding unit configured to hold plural objects to be processed and inserted into and to be extracted from the cylindrical processing container;

    a gas supplying unit configured to supply a gas into the processing container;

    an activating unit configured to be located along a longitudinal direction of the processing container and to activate the gas by plasma generated by a high frequency power;

    a cylindrical shield cover configured to surround a periphery of the processing container and to be connected to ground for shielding from high frequency; and

    a cooling device configured to cause the cooling gas to flow through a space between the cylindrical shield cover and the cylindrical processing container during the plasma process.

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