VAPOR PHASE GROWTH SUSCEPTOR AND VAPOR PHASE GROWTH APPARATUS

• US 20100282170A1
• Filed: 11/26/2008
• Published: 11/11/2010
• Est. Priority Date: 12/06/2007
• Status: Abandoned Application

• Current Assignee: Shin-Etsu Handotai Co., Ltd. (Shin-Etsu Chemical Company Limited)
• Original Assignee: Shin-Etsu Handotai Co., Ltd. (Shin-Etsu Chemical Company Limited)
• Inventors: Nishizawa, Tsuyoshi
• Application Number:
  US12/744,185
• Publication Number:
  US 20100282170A1
• Time in Patent Office: Days
• US Class Current: 118/728
• CPC Class Codes: C23C 16/4581 characterised by material of construction or surface finish of the means for supporting the substrate
• CPC Class Codes: C30B 25/12 Substrate holders or susceptors
• CPC Class Codes: H01L 21/68735 characterised by edge profile or support profile
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions

Abstract

The present invention provides a vapor phase growth susceptor as a susceptor that supports a wafer in a vapor phase growth apparatus for subjecting a thin film to vapor phase growth on a wafer surface, wherein a pocket configured to accommodate a wafer is formed in the susceptor, many rectangular protrusions are formed of grooves having a mesh pattern on a bottom surface of the pocket, and a groove depth at an outer peripheral portion is shallower than that at a central portion of the bottom surface of the pocket. As a result, problems such as a reduction in film thickness due to a drop in temperature at the wafer outer peripheral portion, warpage at the time of mounting the wafer, deposition on a wafer back surface outer peripheral portion, and others are improved.

Claims

1-6. -6. (canceled)

7. A vapor phase growth susceptor as a susceptor that supports a wafer in a vapor phase growth apparatus for subjecting a thin film to vapor phase growth on a wafer surface, wherein a pocket configured to accommodate a wafer is formed in the susceptor, many rectangular protrusions are formed of grooves having a mesh pattern on a bottom surface of the pocket, and a groove depth at an outer peripheral portion is shallower than that at a central portion of the bottom surface of the pocket.

8. The vapor phase growth susceptor according to claim 7, wherein the groove depth is changed to be continuously shallowed from the central portion toward the outer peripheral portion.

9. The vapor phase growth susceptor according to claim 7, wherein the shallowest groove depth at the outer peripheral portion of the bottom surface of the pocket falls within the range of 0.01 to 0.08 mm, and the deepest groove depth at the central portion close to the inner side apart from the outer peripheral portion falls within the range of 0.1 to 0.5 mm.

10. The vapor phase growth susceptor according to claim 8, wherein the shallowest groove depth at the outer peripheral portion of the bottom surface of the pocket falls within the range of 0.01 to 0.08 mm, and the deepest groove depth at the central portion close to the inner side apart from the outer peripheral portion falls within the range of 0.1 to 0.5 mm.

11. The vapor phase growth susceptor according to claim 7, wherein a boundary between the outer peripheral portion and the central portion has a concentric circles shape, and a region of the outer peripheral portion falls within the range of 10 mm to 50 mm from an outer peripheral end of the bottom surface of the pocket.

12. The vapor phase growth susceptor according to claim 8, wherein a boundary between the outer peripheral portion and the central portion has a concentric circles shape, and a region of the outer peripheral portion falls within the range of 10 mm to 50 mm from an outer peripheral end of the bottom surface of the pocket.

13. The vapor phase growth susceptor according to claim 9, wherein a boundary between the outer peripheral portion and the central portion has a concentric circles shape, and a region of the outer peripheral portion falls within the range of 10 mm to 50 mm from an outer peripheral end of the bottom surface of the pocket.

14. The vapor phase growth susceptor according to claim 10, wherein a boundary between the outer peripheral portion and the central portion has a concentric circles shape, and a region of the outer peripheral portion falls within the range of 10 mm to 50 mm from an outer peripheral end of the bottom surface of the pocket.

15. The vapor phase growth susceptor according to claim 7, wherein the susceptor is formed by covering a base material made of graphite with a silicon carbide.

16. The vapor phase growth susceptor according to claim 8, wherein the susceptor is formed by covering a base material made of graphite with a silicon carbide.

17. The vapor phase growth susceptor according to claim 9, wherein the susceptor is formed by covering a base material made of graphite with a silicon carbide.

18. The vapor phase growth susceptor according to claim 10, wherein the susceptor is formed by covering a base material made of graphite with a silicon carbide.

19. The vapor phase growth susceptor according to claim 11, wherein the susceptor is formed by covering a base material made of graphite with a silicon carbide.

20. The vapor phase growth susceptor according to claim 14, wherein the susceptor is formed by covering a base material made of graphite with a silicon carbide.

21. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 7.

22. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 8.

23. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 9.

24. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 10.

25. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 11.

26. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 14.

27. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 15.

28. A vapor phase growth apparatus including the vapor phase growth susceptor according to claim 20.