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Method and System for Using Reflectometry Below Deep Ultra-Violet (DUV) Wavelengths for Measuring Properties of Diffracting or Scattering Structures on Substrate Work Pieces

  • US 20100290033A1
  • Filed: 07/28/2010
  • Published: 11/18/2010
  • Est. Priority Date: 01/16/2003
  • Status: Active Grant
First Claim
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1. A reflectometer apparatus for analyzing a scattering or diffracting structure, comprising:

  • a below deep ultra-violet (DUV) wavelength referencing reflectometer configured for normal incidence operation and having a light source that provides at least below DUV wavelength light, wherein referencing is configured to account for system and environmental changes to adjust reflectance data obtained through use of the reflectometer; and

    at least one computer, which is connected to the reflectometer and is configured to run a computer program which causes the at least one computer to extract structural and optical parameters from a theoretical model of the scattering or diffracting structure,wherein the computer program uses a reduced RCW calculation for analyzing 2-D periodic structures of the scattering or diffracting structure.

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