Aqueous composition containing a semiconductor

• US 20100294304A1
• Filed: 12/07/2009
• Published: 11/25/2010
• Est. Priority Date: 12/21/2000
• Status: Active Grant

• Current Assignee: Karl F. Massholder
• Original Assignee: Karl F. Massholder
• Inventors: Massholder, Karl F.
• Granted Patent: US 8,172,951 B2
• Time in Patent Office: Days
• US Class Current: 134/1
• CPC Class Codes: C11D 2111/46 applying energy, e.g. irradiation
• CPC Class Codes: C11D 3/0063 Photo- activating compounds
• CPC Class Codes: C11D 3/1213 Oxides or hydroxides, e.g. Al2O3, TiO2, CaO or Ca(OH)2
• CPC Class Codes: C11D 7/20 Water-insoluble oxides
• CPC Class Codes: Y10T 428/2982 Particulate matter [e.g., sphere, flake, etc.]

Abstract

The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed.

Claims

1. A method of cleaning a surface, comprising applying to the surface an aqueous composition comprising a semiconductor at a concentration of from 5 to 50 mg, based on 1 L of aqueous composition under the action of light.

2. The method as claimed in claim 1, characterized in that the semiconductor is used at a concentration of from 10 to 50 mg, based on 1 L of aqueous composition.

3. The method as claimed in claim 1, characterized in that the semiconductor is titanium dioxide, preferably a titanium dioxide which is at least 70% by weight in the anatase modification.

4. The method as claimed in claim 1, characterized by the use of a doped semiconductor which contains at least 60 mol % semiconductor ions and less than 40 mol % of one or more doping ions from subgroup 8 of the Periodic Table of the Elements.

5. The method as claimed in claim 4, characterized in that a titanium dioxide semiconductor doped with rhodium and/or platinum ions is used.

6. The method as claimed in claim 1 under the action of light of a wavelength in the range from 350 to 400 nm, preferably 380 nm, in the outdoors field, or in the indoors field under the action of artificial light.

7. The method as claimed in claim 4 under the action of light of a wavelength in the range from 400 to 650 nm.

8. The method as claimed in claim 1, characterized in that the semiconductor has a mean primary particle size, measured by transmission electron microscopy, in the range from 10 to 2000 nm, preferably in the range from 20 to 200 nm.

9. The method as claimed in claim 1, characterized in that the aqueous composition contains one or more of the following auxiliaries:

adhesion promoters, solubilizers, surface-active substances, dispersants and/or thickeners.

10. The method as claimed in claim 1, characterized in that the aqueous semiconductor-containing composition is applied to the surfaces to be cleaned by spraying or by means of a distributor, in particular by means of a brush, a sponge or a cloth.

11. The method as claimed in claim 1 for cleaning buildings or parts thereof or outdoor surrounds of buildings or for cleaning in the indoors field, in particular as kitchen or sanitary cleaner or in medicine, the pharmaceutical industry or the food industry.

12. A semiconductor powder, in particular titanium dioxide, preferably titanium dioxide in the anatase modification, of a mean primary particle size measured by transmission electron microscopy in the range from 10 to 2000 nm, preferably in the range from 20 to 200 nm, suitable for the method as claimed in claim 1.

13. A semiconductor powder containing at least 60 mol % semiconductor ions and less than 40 mol % of one or more doping ions from subgroup 8 of the. Periodic Table of the Elements, in particular rhodium and/or platinum, suitable for the method as claimed in claim 4.