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EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

  • US 20100296070A1
  • Filed: 05/18/2010
  • Published: 11/25/2010
  • Est. Priority Date: 05/20/2009
  • Status: Active Grant
First Claim
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1. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

  • an exposure station where an exposure processing to irradiate an energy beam on an object is performed;

    a measurement station which is placed at a position a predetermined distance away on one side of a direction parallel to a first axis, and where a measurement processing with respect to the object is performed;

    a first movable body which is movable within a first range including the exposure station within a two-dimensional plane including the first axis and a second axis orthogonal to the first axis;

    a second movable body which is movable within a second range including the measurement station within the two-dimensional plane;

    a plurality of holding members which hold the object, and are also supported relatively movable at least within a plane parallel to the two-dimensional plane by the first and second movable bodies, respectively; and

    a support device which can support the holding members, wherebywhile exposure processing with respect to an object held by the holding member supported by the first movable body in exposure station is performed, at least a part of a measurement processing with respect to an object held by the holding member supported by the second movable body in the measurement station and an exchange of an object held by the holding member supported on the support device is concurrently performed.

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