PHOTOCATALYST FILM, PROCESS FOR PRODUCING PHOTOCATALYST FILM, ARTICLE AND METHOD FOR HYDROPHILIZATION
First Claim
1. A photocatalyst film of which at least one main surface contains photo-semiconductor crystallization product, said main surface being a surface that becomes hydrophilic by irradiation with light,wherein the hydrophilization speed thereof when it is irradiated with light having a half-value width of 15 nm or less after kept in a dark place is less than 2 (l/deg/min/105) in an irradiated-light wavelength region of 370 nm or more and is 2 (l/deg/min/105) or more at least partly in an irradiated-light wavelength region of 300 to 360 nm
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Accused Products
Abstract
A photocatalyst film of which at least one main surface contains photo-semiconductor particles; said main surface being a surface that becomes hydrophilic by irradiation with light, wherein the hydrophilization speed thereof when it is irradiated with light having a half-value width of 15 nm or less after kept in a dark place is less than 2 (l/deg/min/105) in an irradiated-light wavelength region of 370 nm or more and is 2 (l/deg/min/105) or more at least partly in an irradiated-light wavelength region of 300 to 360 nm.
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Citations
28 Claims
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1. A photocatalyst film of which at least one main surface contains photo-semiconductor crystallization product, said main surface being a surface that becomes hydrophilic by irradiation with light,
wherein the hydrophilization speed thereof when it is irradiated with light having a half-value width of 15 nm or less after kept in a dark place is less than 2 (l/deg/min/105) in an irradiated-light wavelength region of 370 nm or more and is 2 (l/deg/min/105) or more at least partly in an irradiated-light wavelength region of 300 to 360 nm
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2. A photocatalyst film of which at least one main surface contains, as a photo-semiconductor crystallization product, photo-semiconductor particles having a crystal diameter in the range of 1 to 10 nm.
- 21. A photocatalyst film of which at least one main surface contains, as a photo-semiconductor crystallization product, photo-semiconductor nano-tubes having a tube thickness in the range of 1 to 10 nm.
Specification