Controlled vapor deposition of multilayered coatings adhered by an oxide layer

• US 20100304132A1
• Filed: 07/29/2010
• Published: 12/02/2010
• Est. Priority Date: 06/27/2003
• Status: Active Grant

• Current Assignee: SPTS Technologies Limited (KLA Corporation)
• Original Assignee: Applied Microstructures, Inc. (KLA Corporation)
• Inventors: Yi, Richard C., Chinn, Jeffrey D., Nowak, Romuald, Kobrin, Boris
• Granted Patent: US 8,545,972 B2
• Time in Patent Office: Days
• US Class Current: 428/336
• CPC Class Codes: B05D 1/185 applying monomolecular layers B05D1/204 takes precedence
• CPC Class Codes: B05D 1/60 Deposition of organic layers from vapour phase vapour phase deposition in general C23C14/00, C23C16/00
• CPC Class Codes: B05D 3/142 Pretreatment
• CPC Class Codes: B05D 3/145 After-treatment
• CPC Class Codes: B05D 7/52 Two layers
• CPC Class Codes: B05D 7/56 Three layers or more
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C03C 17/42 at least one coating of an organic material and at least one non-metal coating
• CPC Class Codes: C03C 23/006 by plasma or corona discharge
• CPC Class Codes: C23C 16/0227 by cleaning or etching
• CPC Class Codes: C23C 16/0245 by etching with a plasma
• CPC Class Codes: C23C 16/0272 Deposition of sub-layers, e.g. to promote the adhesion of the main coating
• CPC Class Codes: C23C 16/401 containing silicon
• CPC Class Codes: C23C 16/402 Silicon dioxide
• CPC Class Codes: C23C 16/448 characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• CPC Class Codes: C23C 16/4485 by evaporation without using carrier gas in contact with the source material C23C16/4486 takes precedence
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: C23C 16/45557 Pulsed pressure or control pressure
• CPC Class Codes: C23C 16/56 After-treatment
• CPC Class Codes: Y10T 428/12618 : Plural oxides
• CPC Class Codes: Y10T 428/12632 : Four or more distinct components with alternate recurrence of each type component
• CPC Class Codes: Y10T 428/24 : Structurally defined web or sheet [e.g., overall dimension, etc.]
• CPC Class Codes: Y10T 428/24355 : Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
• CPC Class Codes: Y10T 428/24967 : Absolute thicknesses specified
• CPC Class Codes: Y10T 428/24975 : No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/261 : In terms of molecular thickness or light wave length
• CPC Class Codes: Y10T 428/265 : 1 mil or less
• CPC Class Codes: Y10T 428/31663 : As siloxane, silicone or silane
• CPC Class Codes: Y10T 428/31667 : Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product

Abstract

An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.

Claims

1. A structure comprising a substrate with a multilayered coating deposited over a surface of said substrate, wherein said multilayered coating comprises an organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein a thickness of said oxide-based layer which is in direct contact with said substrate is controlled as a function of the chemical composition of said substrate, whereby an ability of said organic-based layer to bond to said oxide-based layer is improved.

2. A structure in accordance with claim 1, wherein said multilayered coating comprises at least two oxide-based layers and at least one organic-based layer, wherein an oxide-based layer and an organic-based layer are alternated.

3. A structure in accordance with claim 2, wherein said multilayered coating comprises at least two oxide-based layers and at least two organic-based layers, wherein an organic-based layer forms the surface of said multilayered coating.

4. A structure comprising a substrate with a multilayered coating applied over a surface of said substrate, wherein said multilayered coating comprises an organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein said multilayered coating includes alternating layers of oxide-based material and organic-based material.

5. A structure in accordance with claim 4, wherein said oxide-based layer which is deposited directly over said substrate ranges in thickness from about 5 angstroms to about 2000 angstroms.

6. A structure in accordance with claim 5, wherein said oxide-based layer includes a series of deposited oxide-based layers, the total of which makes up said oxide-based layer.

7. A structure in accordance with claim 4, wherein said multilayered coating includes at least two oxide-based layers and at least one organic-based layer.

8. A structure in accordance with claim 7, wherein said oxide-based layer which is deposited directly over said substrate ranges in thickness from about 5 angstroms to about 2000 angstroms.

9. A structure in accordance with claim 8, wherein said oxide-based layer includes a series of deposited oxide-based layers, the total of which makes up said oxide-based layer.

10. A structure in accordance with claim 7, wherein said multilayered coating includes at least two oxide-based layers and at least two organic based layers.

11. A structure in accordance with claim 10, wherein said oxide-based layer which is deposited directly over said substrate ranges in thickness from about 5 angstroms to about 2000 angstroms.

12. A structure in accordance with claim 11, wherein said oxide-based layer includes a series of deposited oxide-based layers, the total of which makes up said oxide-based layer.