LONG WAVELENGTH NONPOLAR AND SEMIPOLAR (Al,Ga,In)N BASED LASER DIODES
First Claim
1. A method of fabricating a III-nitride laser diode (LD) structure, comprising:
- growing one or more III-nitride device layers for a LD on an off-axis surface of a nonpolar or semipolar III-nitride substrate.
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Abstract
A laser diode, grown on a miscut nonpolar or semipolar substrate, with lower threshold current density and longer stimulated emission wavelength, compared to conventional laser diode structures, wherein the laser diode'"'"'s (1) n-type layers are grown in a nitrogen carrier gas, (2) quantum well layers and barrier layers are grown at a slower growth rate as compared to other device layers (enabling growth of the p-type layers at higher temperature), (3) high Al content electron blocking layer enables growth of layers above the active region at a higher temperature, and (4) asymmetric AlGaN SPSLS allowed growth of high Al containing p-AlGaN layers. Various other techniques were used to improve the conductivity of the p-type layers and minimize the contact resistance of the contact layer.
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Citations
28 Claims
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1. A method of fabricating a III-nitride laser diode (LD) structure, comprising:
growing one or more III-nitride device layers for a LD on an off-axis surface of a nonpolar or semipolar III-nitride substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A III-nitride device layer in a III-nitride based laser diode (LD) structure, comprising:
(a) a III-nitride device layer for a LD grown on an off-axis surface of an m-plane III-nitride substrate. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
Specification