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VACUUM PROCESSING APPARATUS AND OPERATING METHOD FOR VACUUM PROCESSING APPARATUS

  • US 20100310785A1
  • Filed: 06/27/2008
  • Published: 12/09/2010
  • Est. Priority Date: 06/27/2008
  • Status: Active Grant
First Claim
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1. A vacuum processing apparatus that carries out a self-cleaning procedure by feeding a cleaning gas into a film deposition chamber in which film deposition processing is carried out on a substrate, wherein a timing interval between self-cleaning procedures is set in a range in which a film deposition operating time ratio is converged with respect to an increase in the film deposition processing amount, where the film deposition operating time ratio represented by a proportion of a film deposition-related operating time in the sum of the film deposition-related operating time, which includes a film deposition time and a film deposition preparation time, and a cleaning-related operating time, which includes a self-cleaning procedure time, a self-cleaning procedure preparation time, and a pre-deposition film deposition time.

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