LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY

• US 20100315578A1
• Filed: 09/07/2007
• Published: 12/16/2010
• Est. Priority Date: 10/18/2006
• Status: Active Grant

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Imai, Hajime, Kitagawa, Hideki, Kikuchi, Tetsuo, Shimada, Junya, Hara, Yoshihito, Imade, Mitsunori
• Granted Patent: US 8,243,236 B2
• Time in Patent Office: Days
• US Class Current: 349/113
• CPC Class Codes: G02F 1/133553 Reflecting elements associated to illuminating devices G02F1/133605

Abstract

A transflective-type and a reflection-type liquid crystal display device having a high reflection efficiency and a high image quality are provided. A liquid crystal display device of the present invention is a liquid crystal display device including a reflection region for reflecting incident light toward a display surface, wherein the reflection region includes a metal layer, an insulating layer formed on the metal layer, a semiconductor layer formed on the insulating layer, and a reflective layer formed on the semiconductor layer; a plurality of recesses are formed in at least one of the metal layer, the insulating layer and the semiconductor layer; a plurality of dents are formed in the reflective layer in the reflection region according to the plurality of recesses; and a shortest distance a between edge portions of at least two of the plurality of recesses is 4 μm or less.

Claims

1. A liquid crystal display device comprising a reflection region for reflecting incident light toward a display surface, wherein

the reflection region includes a metal layer, an insulating layer formed on the metal layer, a semiconductor layer formed on the insulating layer, and a reflective layer formed on the semiconductor layer;

a plurality of recesses are formed in at least one of the metal layer, the insulating layer and the semiconductor layer;

a plurality of dents are formed in the reflective layer in the reflection region according to the plurality of recesses; and

a shortest distance between edge portions of at least two of the plurality of recesses is 4 μ

m or less.

2. The liquid crystal display device of claim 1, wherein the shortest distance between edge portions of at least two recesses is 1 μ

m or more.

3. The liquid crystal display device of claim 1, wherein a maximum width of at least one of the plurality of recesses is 15 μ

m or less.

4. The liquid crystal display device of claim 3, wherein the maximum width of at least one recess is 2 μ

m or more.

5. The liquid crystal display device of claim 1, wherein a shortest distance between an edge portion of any one of the plurality of recesses and an edge portion of another recess located thereto is 4 μ

m or less.

6. A liquid crystal display device comprising a reflection region for reflecting incident light toward a display surface, wherein

the reflection region includes a metal layer, an insulating layer formed on the metal layer, a semiconductor layer formed on the insulating layer, and a reflective layer formed on the semiconductor layer;

a plurality of protrusions are formed in at least one of the metal layer, the insulating layer and the semiconductor layer;

a plurality of projections are formed in the reflective layer in the reflection region according to the plurality of protrusions; and

a maximum width of at least one of the plurality of protrusions is 5 μ

m or less.

7. The liquid crystal display device of claim 6, wherein the maximum width of at least one protrusion is 2 μ

m or more.

8. The liquid crystal display device of claim 6, wherein a shortest distance between edge portions of at least two of the plurality of protrusions is 15 μ

m or less.

9. The liquid crystal display device of claim 8, wherein the shortest distance between edge portions of at least two protrusions is 3 μ

m or more.

10. The liquid crystal display device of claim 6, wherein a shortest distance between an edge portion of any one of the plurality of protrusions and an edge portion of another protrusion located closest thereto is 15 μ

m or less.

11. A method for manufacturing a liquid crystal display device having a reflection region for reflecting incident light toward a display surface, comprising:

a step of forming a metal layer on a substrate;

a step of forming an insulating layer on the metal layer;

a step of forming a semiconductor layer on the insulating layer; and

a step of forming a reflective layer on the semiconductor layer, wherein

a plurality of recesses are formed in at least one of the metal layer, the insulating layer and the semiconductor layer;

in the step of forming a reflective layer, a plurality of dents are formed in the reflective layer in the reflection region according to the plurality of recesses; and

a shortest distance between edge portions of at least two of the plurality of recesses is 4 μ

m or less.

12. The manufacturing method of claim 11, wherein the shortest distance between edge portions of at least two recesses is 1 μ

m or more.

13. The manufacturing method of claim 11, wherein a maximum width of at least one of the plurality of recesses is 15 μ

m or less.

14. The manufacturing method of claim 13, wherein the maximum width of at least one recess is 2 μ

m or more.

15. The manufacturing method of claim 11, wherein a shortest distance between an edge portion of any one of the plurality of recesses and an edge portion of another recess located closest thereto is 4 μ

m or less.

16. The manufacturing method of claim 11, wherein

in the step of forming a metal layer, photolithography technique is used to form the plurality of recesses in the metal layer and form at least one of a gate bus line and a storage capacitor line;

and

a thickness of a resist film used for forming the plurality of recesses is smaller than that of a resist film used for forming at least one of the gate bus line and the storage capacitor line.

17. A method for manufacturing a liquid crystal display device having a reflection region for reflecting incident light toward a display surface, comprising:

a step of forming a metal layer on a substrate;

a step of forming an insulating layer on the metal layer;

a step of forming a semiconductor layer on the insulating layer; and

a step of forming a reflective layer on the semiconductor layer, wherein a plurality of protrusions are formed in at least one of the metal layer, the insulating layer and the semiconductor layer;

in the step of forming a reflective layer, a plurality of projections are formed in the reflective layer in the reflection region according to the plurality of protrusions; and

a maximum width of at least one of the plurality of protrusions is 5 μ

m or less.

18. The manufacturing method of claim 17, wherein the maximum width of at least one protrusion is 2 μ

m or more.

19. The manufacturing method of claim 17, wherein a shortest distance between edge portions of at least two of the plurality of protrusions is 15 μ

m or less.

20. The manufacturing method of claim 19, wherein the shortest distance between edge portions of at least two protrusions is 3 μ

m or more.

21. The manufacturing method claim 17, wherein a shortest distance between an edge portion of any one of the plurality of protrusions and an edge portion of another protrusion located closest thereto is 15 μ

m or less.

22. The manufacturing method of claim 17, wherein

in the step of forming a metal layer, photolithography technique is used to form the plurality of protrusions in the metal layer and form at least one of a gate bus line and a storage capacitor line;

and

a thickness of a resist film used for forming the plurality of protrusions is smaller than that of a resist film used for forming at least one of the gate bus line and the storage capacitor line.

23. A liquid crystal display device comprising a reflection region for reflecting incident light toward a display surface, wherein

the reflection region includes a metal layer, an insulating layer formed on the metal layer, a reflective layer formed on the insulating layer;

a plurality of recesses are formed in at least one of the metal layer and the insulating layer;

a plurality of dents are formed in the reflective layer in the reflection region according to the plurality of recesses; and

a shortest distance between edge portions of at least two of the plurality of recesses is 4 μ

m or less.

24. A liquid crystal display device comprising a reflection region for reflecting incident light toward a display surface, wherein the reflection region includes a metal layer, an insulating layer formed on the metal layer, a reflective layer formed on the insulating layer;

a plurality of protrusions are formed in at least one of the metal layer and the insulating layer;

a plurality of projections are formed in the reflective layer in the reflection region according to the plurality of protrusions; and

a maximum width of at least one of the plurality of protrusions is 5 μ

m or less.

25. A method for manufacturing a liquid crystal display device having a reflection region for reflecting incident light toward a display surface, comprising:

a step of forming a metal layer on a substrate;

a step of forming an insulating layer on the metal layer; and

a step of forming a reflective layer on the insulating layer, wherein

a plurality of recesses are formed in at least one of the metal layer and the insulating layer;

in the step of forming a reflective layer, a plurality of dents are formed in the reflective layer in the reflection region according to the plurality of recesses; and

a shortest distance between edge portions of at least two of the plurality of recesses is 4 μ

m or less.

26. A method for manufacturing a liquid crystal display device having a reflection region for reflecting incident light toward a display surface, comprising:

a step of forming a metal layer on a substrate;

a step of forming an insulating layer on the metal layer; and

a step of forming a reflective layer on the insulating layer, wherein

a plurality of protrusions are formed in at least one of the metal layer and the insulating layer;

in the step of forming a reflective layer, a plurality of projections are formed in the reflective layer in the reflection region according to the plurality of protrusions; and

a maximum width of at least one of the plurality of protrusions is 5 μ

m or less.