Maintenance method, maintenance device, exposure apparatus, and device manufacturing method

• US 20100315609A1
• Filed: 08/16/2010
• Published: 12/16/2010
• Est. Priority Date: 12/06/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Fujiwara, Tomoharu, Nishii, Yasufumi, Shiraishi, Kenichi
• Granted Patent: US 8,456,608 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus

Abstract

An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.

Claims

1. A maintenance method comprising:

moving a stage of an exposure apparatus in which a member is used for forming a liquid immersion region of a first liquid on a substrate and in which the substrate is exposed via the first liquid, the member having a liquid flow passage and the stage being moved to a position away from under the member;

placing a container of a maintenance system under the member in the exposure apparatus; and

cleaning the member with a second liquid, the second liquid being supplied from a supply outlet such that the second liquid comes into contact with the member and the container placed under the member receiving the supplied second liquid.

2. The method according to claim 1, wherein the stage holds the substrate to expose the substrate.