FILM COATING APPARATUS FOR CHEMICAL VAPOR DEPOSITION AND PHYSICAL VAPOR DEPOSITION

• US 20100319622A1
• Filed: 08/14/2009
• Published: 12/23/2010
• Est. Priority Date: 06/18/2009
• Status: Abandoned Application

• Current Assignee: Hon Hai Precision Industry Co., Ltd.
• Original Assignee: Hon Hai Precision Industry Co., Ltd.
• Inventors: PEI, SHAO-KAI
• Application Number:
  US12/541,697
• Publication Number:
  US 20100319622A1
• Time in Patent Office: Days
• US Class Current: 118/728
• CPC Class Codes: C23C 14/22 characterised by the process of coating
• CPC Class Codes: C23C 16/44 characterised by the method of coating C23C16/04 takes precedence

Abstract

An exemplary film coating apparatus includes a housing, a holder for holding a workpiece, and a coating source. The housing defines a chamber therein. The holder and the coating source are received in the chamber. The coating source includes a supporting plate and a number of gas jetting heads. The supporting plate includes a first surface facing the holder, and defines a receiving recess at the first surface configured for receiving a target material, and a number of through holes. The gas jetting heads are capable of introducing one or more gases into the chamber, each gas jetting head passes through one respectively through hole and is fixed in the through hole.

Claims

1. A film coating apparatus comprising:

a housing defining a chamber therein;

a holder received in the chamber, the holder capable of holding a workpiece; and

a coating source received in the chamber, the coating source comprising;

a supporting plate comprising a first surface facing the holder, the supporting plate defining a receiving recess at the first surface configured for receiving a target material, and one or more through holes; and

one or more gas jetting heads capable of introducing one or more gases into the chamber, each gas jetting head passing through one respective through hole and being fixed in the through hole.

2. The film coating apparatus of claim 1, wherein the receiving recess is at the center of the first surface.

3. The film coating apparatus of claim 2, wherein the one or more through holes are a plurality of through holes, which surrounding the receiving recess.

4. The film coating apparatus of claim 1, wherein the supporting plate comprises a cover for covering the receiving recess to prevent the target material from being polluted.

5. The film coating apparatus of claim 4, wherein the cover is pivotably connected to a connecting portion fixed on the first surface of the supporting plate.

6. The film coating apparatus of claim 1, wherein the supporting plate further comprises a second surface, which is at an opposite side of the supporting plate to the first surface, and the coating source further comprises a rotating shaft fixed to the supporting plate at the second surface.

7. The film coating apparatus of claim 1, wherein said one or more gas jetting heads are capable of being connected to a vacuum pump for vacuumizing the chamber of the housing.

8. A film coating apparatus comprising:

a housing defining a chamber therein;

a holder received in the chamber, the holder configured for holding a workpiece; and

a coating source received in the chamber, the coating source comprising;

a supporting plate comprising a first surface facing the holder, the supporting plate defining a receiving recess at the first surface, and one or more through holes;

one or more gas jetting heads capable of introducing gases into the chamber, each gas jetting head passing through one respective through hole and being fixed in the through hole; and

a target material received in the receiving recess.

9. The film coating apparatus of claim 8, wherein the receiving recess is at the center of the first surface.

10. The film coating apparatus of claim 9, wherein the one or more through holes are a plurality of through holes, which surrounding the receiving recess.

11. The film coating apparatus of claim 8, wherein the supporting plate comprises a cover for covering the receiving recess to prevent the target material from being contaminated.

12. The film coating apparatus of claim 11, wherein the cover is pivotably connected to a connecting portion fixed on the first surface of the supporting plate.

13. The film coating apparatus of claim 8, wherein the supporting plate further comprises a second surface, which is at an opposite side of the supporting plate to the first surface, and the coating source further comprises a rotating shaft fixed to the supporting plate at the second surface.

14. The film coating apparatus of claim 8, wherein said one or more gas jetting heads are capable of being connected to a vacuum pump for vacuumizing the chamber of the housing.

15. A film coating apparatus comprising:

a housing defining a chamber therein;

a holder received in the chamber, the holder capable of holding a workpiece; and

a coating source received in the chamber, the coating source comprising;

a supporting plate comprising a first surface facing the holder, the supporting plate defining a receiving recess at the first surface configured for receiving a target material; and

one or more gas jetting heads fixed in the supporting plate and capable of introducing one or more gases into the chamber at a side of the supporting plate corresponding to the first surface.