PARTICLE THERAPY INSTALLATION
First Claim
1. A particle therapy system comprising:
- an ECR ion source for the production of charged ions; and
an accelerator unit that is arranged downstream of the ECR ion source, the accelerator unit for accelerating the charged ions to an energy required for irradiation,wherein magnetic fields of the ECR ion source are attuned to the operation of the ECR ion source for lightweight ions such that the ECR ion source is operable to be operated in an afterglow mode, in which, an afterglow beam pulse is emitted from the ECR ion source after a microwave resonance pulse has been switched off, andwherein the current intensity of the afterglow beam pulse is higher than a current that is emitted from the ECR ion source during the application of the microwave resonance pulse.
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Accused Products
Abstract
A particle therapy system includes an ECR ion source for production of charged ions, which are accelerated in an accelerator unit that follows the ECR ion source. The accelerator unit accelerates the charged ions to an energy that is used for irradiation, where the magnetic fields of the ECR ion source are matched to operation of the ECR ion source for lightweight ions, such that the ECR ion source is operated in the afterglow mode. In the afterglow mode, an afterglow beam pulse is emitted from the ECR ion source after a microwave resonance pulse has been switched off. The current level of the afterglow beam pulse is higher than a current that is emitted from the ECR ion source during use of the microwave resonance pulse.
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Citations
16 Claims
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1. A particle therapy system comprising:
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an ECR ion source for the production of charged ions; and an accelerator unit that is arranged downstream of the ECR ion source, the accelerator unit for accelerating the charged ions to an energy required for irradiation, wherein magnetic fields of the ECR ion source are attuned to the operation of the ECR ion source for lightweight ions such that the ECR ion source is operable to be operated in an afterglow mode, in which, an afterglow beam pulse is emitted from the ECR ion source after a microwave resonance pulse has been switched off, and wherein the current intensity of the afterglow beam pulse is higher than a current that is emitted from the ECR ion source during the application of the microwave resonance pulse. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification